Ion Implantation and Beam Processing - 1st Edition - ISBN: 9780127569802, 9781483220642

Ion Implantation and Beam Processing

1st Edition

Editors: J. S. Williams J. M. Poate
eBook ISBN: 9781483220642
Imprint: Academic Press
Published Date: 1st April 1984
Page Count: 432
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Description

Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.

Table of Contents

List of Contributors Preface 1 Introduction to Implantation and Beam Processing I. Beams and Materials II. Amorphization and Crystallization III. Fundamental Processes IV. Semiconductor Technology and Applications 2 Amorphization and Crystallization of Semiconductors I. Introduction II. Implantation Damage and Amorphization III. Solid-Phase Crystallization IV. Liquid-Phase Crystallization V. Thermodynamic Considerations VI. Amorphization and Crystallization Perspectives References 3 Application of the Boltzmann Transport Equation to Ion Implantation in Semiconductors and Multilayer Targets I. Introduction II. Range Distributions in Multilayer Targets III. Damage Distribution in Semiconductors IV. Summary References 4 High Energy Density Collision Cascades and Spike Effects I. Introduction II. Collision Cascade Concepts III. Experimental Examples of Spike Effects IV. Thermal Spike Concepts V. Conclusions References 5 Implantation of Insulators: Ices and Lithographic Materials I. Introduction II. Ion Erosion of Condensed Gas Films III. Ion Beam Lithography IV. Conclusions References 6 Ion-Bombardment-Induced Composition Changes in Alloys and Compounds I. Introduction II. Sputtering of Elemental Targets III. Sputtering of Two-Component Systems IV. Particle Fluxes at the Surface V. High Fluence Ion Implantation VI. Conclusions References 7 Ion Beam and Laser Mixing: Fundamentals and Applications I. Introduction II. Fundamental Mechanisms III. Materials Alterations Induced by Ion Beam and Pulsed Laser Processing IV. Concluding Remarks References 8 High-Dose Implantation I. Introduction II. Implanting at High Doses III. Effect of Implant Temperature on Damage IV. Behavi

Details

No. of pages:
432
Language:
English
Copyright:
© Academic Press 1984
Published:
Imprint:
Academic Press
eBook ISBN:
9781483220642

About the Editor

J. S. Williams

J. M. Poate

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