Handbook of VLSI Microlithography

1st Edition

Principles, Technology and Applications

Editors: William B. Glendinning John N. Helbert
Hardcover ISBN: 9780815512813
eBook ISBN: 9781437728224
Imprint: William Andrew
Published Date: 1st January 1991
Page Count: 671
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Description

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry.

The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.

Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Readership

Workers in the Very Large Scale Integrated Circuit (VLSI) industry involved with production of high density integrated circuit semiconductors such as DRAM--including production engineers, research and development scientists and technicians as well as academics

Table of Contents

Issues and Trends Affecting Lithography Tool Selection Strategy
Resist Technology ù Design, Processing, and Applications
Lithography Process Monitoring and Defect Detection
Techniques and Tools for Photo Metrology
Techniques and Tools for Optical Lithography
Microlithography Tool Automation
Electron-Beam ULSI Applications
Rational Vibration and Structural Dynamics for Lithographic Tool Installations
Applications of Ion Microbeams Lithography and Direct Processing
X-Ray Lithography
Part I
Part II
Acknowledgment
References
Index

Details

No. of pages:
671
Language:
English
Copyright:
© William Andrew 1991
Published:
Imprint:
William Andrew
eBook ISBN:
9781437728224
Hardcover ISBN:
9780815512813

About the Editor

William B. Glendinning

John Helbert is a Senior Member of the Motorola Technical Staff. He earned his doctorate in Physical

Affiliations and Expertise

Motorola, USA

John N. Helbert

Affiliations and Expertise

Motorola, USA