Description

This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.

Readership

Engineers, including surface engineering personnel, technicians, and other plant personnel in process industries such as semiconductors and microelectronics. Especially informative for those new to the field.

Table of Contents

Part I: Fundamentals of Vacuum Arc Science and Technology 1. Electrical Discharges and Plasmas-A Brief Tutorial Definitions and Purpose of the Chapter Collision Processes Collective Behavior Conduction of Electrical Current Magnetic Effects Electrode Effects Chapter Summary References 2. Arc Ignition Introduction Field Emission Insulator Enhanced Emission Particle Effects Main Insulator Considerations Breakdown-to-Arc Transition Arc Ignition from Low Voltage Sources Laser Ignition Hollow-Cathode Arc Chapter Summary References 3. Cathode Spots Phenomenology Theories of Cathode Spots Chapter Summary References 4. The Interelectrode Plasma Introduction The Multi-Cathode Spot Vacuum Arc Experimental Characterization of the Interelectrode Plasma The Interelectrode Plasma in an External Magnetic Field The Interelectrode Plasma Model Plasma-Macroparticles Interaction Plasma and Current Interaction with a Magnetic Field Summary and Conclusions References 5. Anode Phenomena Introduction Anode Modes Transitions Between Anode Modes Theories and Models of Anode Phenomena Part II: Applications of Vacuum Arc Science and Technology 6. Coatings From the Vacuum Arc Vacuum Arc Deposition Arc Source Designs Rigid-Rotor Models of Plasma Flow Film Growth Applications of Arc-Deposi

Details

No. of pages:
773
Language:
English
Copyright:
© 1996
Published:
Imprint:
William Andrew
eBook ISBN:
9780815517795
Print ISBN:
9780815513759

About the editors

Raymond L. Boxman

Affiliations and Expertise

Tel Aviv University, Israel

David M. Sanders

Affiliations and Expertise

David Sanders formerly professor at Lawrence Livermore National Laboratory

Philip J. Martin

Affiliations and Expertise

CSIRO, Division of Applied Physics, Australia

Reviews

This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.