
Handbook of Solid State Diffusion: Volume 2
Diffusion Analysis in Material Applications
Description
Key Features
- Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis
- Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion
- Covers bulk, thin film, and nanomaterials
- Introduces the problems and analysis in important materials systems in various applications
- Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe
Readership
Students, academicians, researchers dealing with solid-state diffusion. Scientists and professionals involved in materials for various applications and for the development of new materials
Table of Contents
Chapter 1: Diffusion Measurements in Nanostructures
- Abstract
- 1.1. Analytical Solutions
- 1.2. Simulations
- 1.3. Atom Probe Tomography
- 1.4. Atomic Transport Kinetic Measurements
- Conclusion
- References
Chapter 2: Diffusion-Controlled Phase Transformations in Open Systems
- Abstract
- 2.1. General Review of Flux-Driven Transformations
- 2.2. Standard Model of the Simultaneous, Diffusion-Controlled Phase Layers Growth in the Diffusion Couple
- 2.3. Flux-Driven Ripening of Cu6Sn5 Scallops During Reaction of Cu Substrate With Liquid Tin-Based Solder
- 2.4. Flux-Driven Lamellar Precipitation of Cu6Sn5 into Porous Cu3Sn Structure
- 2.5. Flux-Driven Nucleation During Reactive Diffusion
- 2.6. Summary
- References
Chapter 3: Thermodynamic-Kinetic Method on Microstructural Evolutions in Electronics
- Abstract
- 3.1. Introduction
- 3.2. Thermodynamic Evaluation of Phase Equilibria
- 3.3. Kinetic Considerations
- 3.4. Thermodynamic-Kinetic Method
- 3.5. Utilization of the T-K Method in Microsystems Technology
- Conclusions
- References
Chapter 4: Microstructural Evolution by Reaction–Diffusion: Bulk, Thin Film, and Nanomaterials
- Abstract
- 4.1. Mathematical Formulations for Estimation of the Diffusion Coefficients Utilizing Physicochemical Model
- 4.2. Estimation of the Diffusion Parameters Following Physicochemical Approach
- 4.3. Evolution of Microstructure Depending on the Location of Kirkendall Marker Plane
- 4.4. A Few Examples of Morphological Evolutions and Indications of Diffusion Rates of Components
- References
Chapter 5: Electromigration in Metallic Materials and Its Role in Whiskering
- Abstract
- Acknowledgements
- 5.1. Introduction to Electromigration
- 5.2. Introduction to Whiskering in Tin Coatings
- 5.3. Role of Electromigration in Whiskering
- 5.4. Summary
- References
Chapter 6: Diffusion Couple Technique: A Research Tool in Materials Science
- Abstract
- 6.1. Introduction
- 6.2. Basic Experimental Procedures Used in Diffusion Couple Method
- 6.3. Derivation of Kinetic Data From Diffusion Couple Experiments
- 6.4. The Diffusion Couple Technique in Phase Diagram Determination – Revisited
- 6.5. A Diffusion Couple Approach in Studying Composition–Structure–Property Relationships in Solid Solution Alloy Systems
- References
Chapter 7: Diffusion-Controlled Internal Precipitation Reactions
- Abstract
- 7.1. Introduction
- 7.2. Basic Experimental Procedures Used in Research on Solid-State Internal Reactions
- 7.3. Diversity of Forms and Variations of Microstructures Generated by Internal Precipitation Reactions – Selected Experimental Results
- 7.4. Thermodynamic-Diffusion Kinetics Approach in Evaluating Internal Solid-State Reactions
- 7.5. Kinetic Analysis of the Internal Precipitation Reactions in Binary Alloys
- 7.6. Internal Precipitation Reactions as a “Research Tool” for Evaluating Interstitial Transport in Metals
- 7.7. Deformation Phenomena Accompanying Internal Precipitation Reactions in Metals
- 7.8. Concluding Remarks
- References
Chapter 8: Diffusion in Nuclear Materials
- Abstract
- 8.1. Diffusion in Nuclear Fuels
- 8.2. Diffusion in Clad Materials
- 8.3. Diffusion in Structural Materials
- References
Chapter 9: The Growth of Silicides and Germanides
- Abstract
- Acknowledgements
- 9.1. Introduction
- 9.2. Experimental Procedure
- 9.3. Growth of Silicides: Bulk Diffusion Couple Versus Thin Film
- 9.4. Mechanisms of Formation of Ni Silicides and Germanides
- 9.5. Alloy Elements
- 9.6. Dopant and Silicide
- 9.7. Formation of Silicide in Transistors
- 9.8. Conclusion
- References
Product details
- No. of pages: 476
- Language: English
- Copyright: © Elsevier 2017
- Published: April 10, 2017
- Imprint: Elsevier
- Hardcover ISBN: 9780128045480
- eBook ISBN: 9780128045787
About the Editors
Aloke Paul
Affiliations and Expertise
Sergiy Divinski
Affiliations and Expertise
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