Key Features

• Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits.
• As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries.
• Covers processes and equipment, as well as new materials and changes required for the surface conditioning process.
• Editors are two of the top names in the field and are both extensively published.
• Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol.


Managers, engineers, and technicians that manufacture integrated circuits or supply the semiconductor and microelectronics industries.


No. of pages:
© 2008
William Andrew
Print ISBN:
Electronic ISBN:

About the authors

Karen Reinhardt

Karen A. Reinhardt is Principle Consultant at Cameo Consulting in San Jose, California. At Cameo Consulting she assists companies investigating and assessing new and unique cleaning technologies that will allow realization of the ITRS roadmap with respect to smaller geometries, new materials, and the environmental issues associated with current cleaning processes. Karen has published over 30 technical papers ranging from plasma processing to damage characterization and cleaning technology assessment. She has been awarded eight patents. Karen formerly co-chaired the ITRS Surface Preparation Technical Working Group. Prior to forming a contracting and consulting company, Karen was employed at Novellus Systems and Advanced Micro Devices. Karen has a BS degree in Chemistry from the University of California at Riverside and a MS degree in Inorganic Chemistry from Texas Tech University.

Affiliations and Expertise

Cameo Consulting, San Jose, California, U.S.A

Werner Kern

Affiliations and Expertise

Lam Research, San Diego, California