Description

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Readership

Completely up-to-date look at the entire chemical vapor deposition process, for engineers and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, filter and other industries.

Table of Contents

1. Introduction and General Considerations 1.0 Introduction 2.0 Historical Perspective 3.0 The Applications Of CVD 4.0 Profile of the CVD Business 5.0 Book Objectives 6.0 Background References References 2. Fundamentals of Chemical Vapor Deposition 1.0 Introduction 2.0 Thermodynamics of CVD 3.0 Kinetics and Mass-Transport Mechanisms 4.0 Growth Mechanism and Structure of Deposit References 3. The Chemistry of CVD 1.0 Categories of CVD Reactions 2.0 CVD Precursors 3.0 Halide Precursors 4.0 Metal-Carbonyl Precursors 5.0 Hydride Precursors References 4. Metallo-Organic CVD (MOCVD) 1.0 Introduction 2.0 MOCVD Process and Equipment 3.0 MOCVD Precursors: Alkyl, Alicyclic, and Aryl Compounds 4.0 Acetylacetonate Compounds 5.0 MOCVD Reactions for the Deposition of Metals 6.0 MOCVD Reactions for the Deposition of Carbides and Nitrides 7.0 MOCVD Reactions for the Deposition of Oxides 8.0 MOCVD Reactions for fhe Deposition of III-V and II-VI Compounds 9.0 General Applications of MOCVD References 5. CVD Processes and Equipment 1.0 Introduction 2.0 Closed and Open Reactor 3.0 Reactant Supply 4.0 Thermal CVD: Deposition System and Reactor Design 5.0 Exhaust and By-Product Disposal 6.0 Laser and Photo CVD 7.0 Chemical Vapor Infiltration (CVI) 8.0 Fluidized-Bed CVD 9.0 Plasma CVD References 6. The CVD of Metals 1.0 Introduction 2.0

Details

No. of pages:
506
Language:
English
Copyright:
© 1999
Published:
Imprint:
William Andrew
Print ISBN:
9780815514329
Electronic ISBN:
9780080946689

About the author

Hugh O. Pierson

Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

Affiliations and Expertise

Sandia National Laboratories (retired)

Reviews

".presents an objective and systematic assessment." - High Tech Ceramics News