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Treatise on Materials Science and Technology, Volume 28: Glass IV covers the developments in glass science and technology. The book discusses the use of silicon dioxide films in semiconductor devices; the nuclear waste glasses; and the synthesis and properties of oxynitride glasses. The text also describes the preparation, the properties, and the applications of heavy-metal fluoride glasses; and an analytical model of viscoelasticity in seals. Materials scientists and materials engineers will find the book invaluable.
List of Contributors
1 Silicon Dioxide Films in Semiconductor Devices
II. Physicochemical Aspects of Thin Glass Films
III. Electrical Properties and Their Characterization
2 Nuclear Waste Glasses
II. Waste Disposal Strategy
III. High-Level Waste
IV. Processing Considerations—Vitrification
V. Waste-Glass Performance
VI. Radionuclide Immobilization in Waste-Glass Disposal Systems
3 Oxynitride Glasses
II. Oxynitride Glass Synthesis
III. Compositional Systems
IV. Oxynitride Glass Properties
V. Crystallization of Oxynitride Glasses
VI. Structure of Oxynitride Glasses
VII. Applications of Oxynitride Glasses
4 Heavy-Metal Fluoride Glasses
II. Glass Formation and the Structure of Heavy-Metal Fluoride Glasses
III. Preparation of Heavy-Metal Fluoride Glasses
IV. Properties of Heavy-Metal Fluoride Glasses
V. Summary and Conclusion
5 Viscoelastic Analysis of Stresses in Composites
II. Principles of Relaxation
III. Viscoelastic Analysis of Seals
IV. Setting Temperature in Stress Analysis of Composites
V. Glass-to-Glass Seals
Appendix. Constants in the Viscoelastic Analyses
List of Symbols
- No. of pages:
- © Academic Press 1985
- 25th April 1985
- Academic Press
- eBook ISBN:
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