Epitaxial Growth of Complex Metal Oxides

Epitaxial Growth of Complex Metal Oxides

1st Edition - May 14, 2015

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  • Editors: Gertjan Koster, Mark Huijben, Guus Rijnders
  • Hardcover ISBN: 9781782422457
  • eBook ISBN: 9781782422556

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The atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflection high-energy electron diffraction, pulsed laser deposition, hybrid molecular beam epitaxy, sputtering processes and chemical solution deposition techniques for the growth of oxide thin films. Part Two goes on to explore the effects of strain and stoichiometry on crystal structure and related properties, in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films in Part Three.

Key Features

  • Provides valuable information on the improvements in epitaxial growth processes that have resulted in higher quality films of complex metal oxides and further advances in applications for electronic and optical purposes
  • Examines the techniques used in epitaxial thin film growth
  • Describes the epitaxial growth and functional properties of complex metal oxides and explores the effects of strain and defects


All those who are working in the analysis, characterization, fabrication and application of new complex metal oxides, thin films, nano-materials and related technologies, including scientists, applied researchers, production engineers, post-graduates and academic researchers.

Table of Contents

    • Related titles
    • List of Contributors
    • Woodhead Publishing Series in Electronic and Optical Materials
    • Part One. Epitaxial growth of complex metal oxides
      • 1. Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED)
        • 1.1. Introduction: reflection high-energy electron diffraction and pulsed laser deposition
        • 1.2. Basic principles of RHEED
        • 1.3. Variations of the specular intensity during deposition
        • 1.4. RHEED intensity variations during heteroepitaxy: examples
        • 1.5. Conclusions
      • 2. Sputtering techniques for epitaxial growth of complex oxides
        • 2.1. Introduction
        • 2.2. General considerations for sputtering of complex oxides
        • 2.3. A practical guide to the sputtered growth of perovskite titanate ferroelectrics
        • 2.4. Conclusions
      • 3. Hybrid molecular beam epitaxy for the growth of complex oxide materials
        • 3.1. Introduction
        • 3.2. Metal-organic precursors for oxide hybrid molecular beam epitaxy (HMBE)
        • 3.3. Deposition kinetics of binary oxides from metal-organic (MO) precursors
        • 3.4. Opening a growth window with MO precursors
        • 3.5. Properties of materials grown by hybrid oxide molecular beam epitaxy (MBE)
        • 3.6. Limitations of HMBE and future developments
      • 4. Chemical solution deposition techniques for epitaxial growth of complex oxides
        • 4.1. Introduction
        • 4.2. Reagents and solvents
        • 4.3. Types of chemical solution deposition (CSD) processes
        • 4.4. Film and pattern formation
        • 4.5. Crystallization, densification and epitaxy
        • 4.6. Examples of CSD-derived oxide films
        • 4.7. Conclusions
      • 5. Epitaxial growth of superconducting oxides
        • 5.1. Introduction
        • 5.2. Overview of epitaxial growth of superconducting oxides
        • 5.3. Requirements for growth of high-quality complex metal-oxide films by molecular-beam epitaxy (MBE)
        • 5.4. Case studies
        • 5.5. Synthesis of new superconductors by thin-film growth methods
        • 5.6. Conclusions and future trends
        • 5.7. Sources of further information and advice
      • 6. Epitaxial growth of magnetic-oxide thin films
        • 6.1. Introduction
        • 6.2. Magnetism and major magnetic-oxide systems
        • 6.3. The effects of thin-film epitaxy on magnetism
        • 6.4. Characterization of magnetic-oxide thin films
        • 6.5. Applications of epitaxial magnetic-oxide thin films
        • 6.6. Future of epitaxy of complex-oxide magnets
    • Part Two. Properties and analytical techniques
      • 7. The effects of strain on crystal structure and properties during epitaxial growth of oxides
        • 7.1. Introduction
        • 7.2. Crystal structures of perovskites and related oxides
        • 7.3. Lattice mismatch-induced stress accommodation in oxide thin films
        • 7.4. Effect of misfit strain-induced distortions on transport and magnetic properties
        • 7.5. Conclusions and future directions
      • 8. Defects, impurities, and transport phenomenon in oxide crystals
        • 8.1. Introduction
        • 8.2. Oxygen ion transport in yttria-stabilized zirconia (YSZ)
        • 8.3. Structural disorder and transport in defect oxide pyrochlores
        • 8.4. Space charge effects at grain boundaries
        • 8.5. Effects of epitaxial strain on ion transport at oxide interfaces
      • 9. Stoichiometry in epitaxial oxide thin films
        • 9.1. Introduction
        • 9.2. General aspects of stoichiometry transfer in physical vapor deposition techniques
        • 9.3. Cation stoichiometry transfer during pulsed laser deposition (PLD) growth
        • 9.4. Adjustment of oxygen stoichiometry during PLD growth
        • 9.5. Accommodation of nonstoichiometry in oxide thin films
        • 9.6. Impact of nonstoichiometry on oxide thin-film properties
        • 9.7. Future trends
        • 9.8. Sources of further information
      • 10. In situ X-ray scattering of epitaxial oxide thin films
        • 10.1. X-ray toolkits for probing surface/interface: an expanding list
        • 10.2. Watching surface/interface evolution for epitaxial oxide synthesis
        • 10.3. Interrogating emergent properties at oxide interfaces
        • 10.4. Probing functional epitaxial oxide heterostructures for energy harvesting
        • 10.5. Future perspectives
      • 11. Scanning probe microscopy (SPM) of epitaxial oxide thin films
        • 11.1. Introduction
        • 11.2. Basic principles of scanning probe microscopy
        • 11.3. Scanning probe microscopy studies of “colossal” magnetoresistive (CMR) manganite thin films
        • 11.4. Scanning probe microscopy study of ferroelectric and multiferroic thin films
        • 11.5. Cross-sectional scanning tunneling microscopy, spectroscopy, and electrochemical strain microscopy
        • 11.6. Projective views on microscopic characterization of epitaxial oxide films
    • Part Three. Applications of complex metal oxides
      • 12. Optoelectronics: optical properties and electronic structures of complex metal oxides
        • 12.1. Introduction
        • 12.2. Introduction to optical spectroscopy
        • 12.3. Optical spectroscopic studies on oxide thin films and heterostructures
        • 12.4. In situ optical spectroscopic characterization
        • 12.5. Summary and outlook
      • 13. Spintronics: an application of complex metal oxides
        • 13.1. Introduction: present stakes for spintronics
        • 13.2. Magnetic interactions in complex metal oxides
        • 13.3. Spintronic techniques
        • 13.4. Complex oxide electrodes for spintronics
        • 13.5. Spacers with intrinsic functionality
        • 13.6. Conclusions and perspectives
      • 14. Thermoelectric oxides
        • 14.1. Introduction to thermoelectrics
        • 14.2. Thermoelectric figure of merit
        • 14.3. Promising thermoelectric materials
        • 14.4. Thermoelectric confinement in thin films
        • 14.5. Epitaxial thermoelectric cobaltate heterostructures
        • 14.6. Conclusions and outlook
      • 15. Solid-oxide fuel cells
        • 15.1. Introduction
        • 15.2. Thin films as solid-oxide fuel cell (SOFC) components
        • 15.3. Cell designs
        • 15.4. Cell performance: status and perspectives
    • Index

Product details

  • No. of pages: 504
  • Language: English
  • Copyright: © Woodhead Publishing 2015
  • Published: May 14, 2015
  • Imprint: Woodhead Publishing
  • Hardcover ISBN: 9781782422457
  • eBook ISBN: 9781782422556

About the Editors

Gertjan Koster

Gertjan Koster is a Professor at the University of Twente in the Netherlands. He is also a visiting professor at the Joseph Stephan Institute in Slovenia. His current research focuses on the growth and study of artificial materials, the physics of reduced scale (nanoscale) materials, metal–insulator transitions, and in situ spectroscopic characterization.

Affiliations and Expertise

Professor, MESA+ Institute for Nanotechnology,University of Twente, Enschede, The Netherlands

Mark Huijben

Mark Huijben is a Professor at the University of Twente in the Netherlands. He is also a Guest Scientist of the IEK-1 Electrochemical Storage Department at Forschungszentrum Jülich in Germany. His research currently focuses on nanostructured thin films for advanced energy conversion and storage.

Affiliations and Expertise

Professor, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands.

Guus Rijnders

Guus Rijnders is a Professor and Chairman of Inorganic Materials Science, University of Twente, Enschede, Netherlands. His research currently focuses on the integration of functional and smart materials with electronic and microelectromechanical systems (MEMS).

Affiliations and Expertise

Professor, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands

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