Electron-Beam Technology in Microelectronic Fabrication - 1st Edition - ISBN: 9780121335502, 9780323153416

Electron-Beam Technology in Microelectronic Fabrication

1st Edition

Editors: George Brewer
eBook ISBN: 9780323153416
Imprint: Academic Press
Published Date: 28th July 1980
Page Count: 376
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Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

Table of Contents

List of Contributors


1 High Resolution Lithography

I. Introduction

II. The Need for an Improved Lithography

III. Electron-Beam Lithography

IV. Technical Benefits of High Resolution Lithography

V. Limitations on Electron-Beam Lithography

VI. Economic Factors

VII. Status and Future of the Technology

VIII. The Contents of This Book


2 Electron-Beam Processes

I. Introduction

II. Electron Scattering in Solids

III. Resist Images

IV. Electron-Resist Characteristics

V. Processing with Electron Resists

VI. Electron-Beam Alignment

VII. Summary


3 Electron-Beam Lithography Machines

I. General Description

II. The Electron-Optical Column

III. Machine Design and Operating Strategies

IV. State-of-the-Art Machine Characteristics


4 Device Fabrication by Electron-Beam Lithography

I. Background

II. Comparison of Photo- and Electron-Beam Lithography

III. Characteristics of Electron-Beam Lithography

IV. Electron Devices Made with Electron-Beam Lithography

V. Processing Constraints on Electron-Beam Lithography

VI. Summary


5 Mask Fabrication by Electron-Beam Lithography

I. Introduction

II. Mask Fabrication Requirements

III. Mask Fabrication Methods

IV. Choice of Materials

V. Processing

VI. Performance

VII. Outlook


6 Replication Techniques

I. Introduction

II. Physics of Replication Systems

III. Description of Replication Systems

IV. Comparison among the Several Replication Methods




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© Academic Press 1980
Academic Press
eBook ISBN:

About the Editor

George Brewer

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