Developments in Surface Contamination and Cleaning - Vol 2

1st Edition

Particle Deposition, Control and Removal

Authors: Rajiv Kohli Kashmiri L. Mittal
Hardcover ISBN: 9781437778304
eBook ISBN: 9781437778311
Imprint: William Andrew
Published Date: 6th November 2009
Page Count: 312
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Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.

Topics covered include:

  • A systems analysis approach to contamination control
  • Physical factors that influence the behavior of particle deposition in enclosures
  • An overview of current yield models and description of advanced models
  • Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants
  • In-depth coverage of ultrasonic cleaning
  • Contamination and cleaning issues at the nanoscale
  • Experimental results illustrating the impact of model parameters on the removal of particle contamination

The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding).


Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration.


Key Features

·    Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination

·    Covers contamination and cleaning issues at the nanoscale

·    Includes an in-depth look at ultrasonic cleaning


R&D, Quality Control and operations personnel involved in contamination-sensitive manufacturing across a wide range of industry sectors: semiconductor & electronics, biotech & pharmaceuticals, medical devices, optics, aerospace, flat panel displays, food...

Table of Contents

Particle Deposition onto Enclosure Surfaces; Contamination Control: A Systems Approach; Particles in Semiconductor Processing; Continuous Contamination Monitoring Systems; Strippable Coatings for Removal of Surface Contaminants; Ultrasonic Cleaning


No. of pages:
© William Andrew 2010
William Andrew
eBook ISBN:
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About the Author

Rajiv Kohli

NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA’s highest awards, for contributions to the Space Shuttle Return to Flight project.

Affiliations and Expertise

National Aeronautics and Space Administration, Houston, TX, USA

Kashmiri L. Mittal

Editor: ‘Reviews of Adhesion and Adhesives’ was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.

Affiliations and Expertise

Editor, Reviews of Adhesion and Adhesives