Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning - 1st Edition - ISBN: 9780323431576, 9780323431729

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

1st Edition

Volume 9

Authors: Rajiv Kohli Kashmiri L. Mittal
eBook ISBN: 9780323431729
Hardcover ISBN: 9780323431576
Imprint: William Andrew
Published Date: 11th November 2016
Page Count: 212
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Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods.

This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales.

Key Features

  • Provides a comprehensive coverage of innovations in surface cleaning
  • Written by established experts in the surface cleaning field, presenting an authoritative resource
  • Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process


Engineers, scientists and technicians involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, semiconductors, aerospace, optics, xerography and medical applications

Table of Contents

  • List of Contributors
  • About the Editors
  • Preface
  • Chapter 1. Nonaqueous Cleaning Challenges for Preventing Damage to Fragile Nanostructures
    • Abstract
    • 1 Introduction
    • 2 Water-Caused Problems in Device Fabrication
    • 3 HF Vapor Processing
    • 4 Cryogenic Aerosol Nitrogen Cleaning
    • 5 Supercritical Fluid Cleaning
    • 6 Pinpoint Cleaning
    • 7 Summary
    • References
  • Chapter 2. Gas-Phase Cleaning for Removal of Surface Contaminants
    • Abstract
    • 1 Introduction
    • 2 Surface Contamination and Cleanliness Levels
    • 3 General Principles of Gas-Phase Cleaning
    • 4 Process Variables in Gas-Phase Cleaning
    • 5 Cleaning Systems
    • 6 Cost Benefits
    • 7 Advantages and Disadvantages of Gas-Phase Cleaning
    • 8 Applications
    • 9 Summary
    • AcknowledgementS
    • Disclaimer
    • References
  • Chapter 3. Laser-Induced Spray Jet Cleaning
    • Abstract
    • 1 Introduction
    • 2 Laser-Induced Spray Jet Cleaning
    • 3 Nanoscale Particle Removal
    • 4 LSJC Using Isopropyl Alcohol
    • 5 Summary and Conclusions
    • Acknowledgements
    • References
  • Chapter 4. Brush Scrubbing for Post-CMP Cleaning
    • Abstract
    • 1 Introduction
    • 2 Particle Removal Mechanism
    • 3 Process and Tool Kinematics
    • 4 Consumables
    • 5 Related Issues
    • 6 Summary
    • Appendix: Application of Tribology to Post-CMP Brush Scrubbing
    • References
  • Chapter 5. Contamination Removal From UV and EUV Photomasks
    • Abstract
    • 1 Introduction
    • 2 Effect of Photomask Contamination on Lithography Process
    • 3 Haze Effect on Photomask Surface
    • 4 The Particle Removal Process
    • 5 Organics Removal
    • 6 EUVL Mask Cleaning
    • 7 Summary
    • References
  • Chapter 6. Aqueous Displacement of Water-Immiscible Cleaning Solvents: Cleaning Enhancement Using Ultrasonics
    • Abstract
    • 1 Background
    • 2 The Aqueous Displacement Solution Process
    • 3 ADS Cleaning Process Requirements and Parameters
    • 4 Drying
    • 5 Evaluation for Hydrophilicity and Wettability
    • 6 Results of Displacement Tests
    • 7 Cleanliness Evaluation Tests
    • 8 Summary
    • Acknowledgements
    • References
  • Index


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© William Andrew 2017
William Andrew
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About the Author

Rajiv Kohli

NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA’s highest awards, for contributions to the Space Shuttle Return to Flight project.

Affiliations and Expertise

National Aeronautics and Space Administration, Houston, TX, USA

Kashmiri L. Mittal

Editor: ‘Reviews of Adhesion and Adhesives’

was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.

Affiliations and Expertise

Editor, Reviews of Adhesion and Adhesives

Ratings and Reviews