Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

Volume 9

1st Edition - November 4, 2016

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  • Authors: Rajiv Kohli, Kashmiri L. Mittal
  • Hardcover ISBN: 9780323431576
  • eBook ISBN: 9780323431729

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Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales.

Key Features

  • Provides a comprehensive coverage of innovations in surface cleaning
  • Written by established experts in the surface cleaning field, presenting an authoritative resource
  • Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process


Engineers, scientists and technicians involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, semiconductors, aerospace, optics, xerography and medical applications

Table of Contents

    • List of Contributors
    • About the Editors
    • Preface
    • Chapter 1. Nonaqueous Cleaning Challenges for Preventing Damage to Fragile Nanostructures
      • Abstract
      • 1 Introduction
      • 2 Water-Caused Problems in Device Fabrication
      • 3 HF Vapor Processing
      • 4 Cryogenic Aerosol Nitrogen Cleaning
      • 5 Supercritical Fluid Cleaning
      • 6 Pinpoint Cleaning
      • 7 Summary
      • References
    • Chapter 2. Gas-Phase Cleaning for Removal of Surface Contaminants
      • Abstract
      • 1 Introduction
      • 2 Surface Contamination and Cleanliness Levels
      • 3 General Principles of Gas-Phase Cleaning
      • 4 Process Variables in Gas-Phase Cleaning
      • 5 Cleaning Systems
      • 6 Cost Benefits
      • 7 Advantages and Disadvantages of Gas-Phase Cleaning
      • 8 Applications
      • 9 Summary
      • AcknowledgementS
      • Disclaimer
      • References
    • Chapter 3. Laser-Induced Spray Jet Cleaning
      • Abstract
      • 1 Introduction
      • 2 Laser-Induced Spray Jet Cleaning
      • 3 Nanoscale Particle Removal
      • 4 LSJC Using Isopropyl Alcohol
      • 5 Summary and Conclusions
      • Acknowledgements
      • References
    • Chapter 4. Brush Scrubbing for Post-CMP Cleaning
      • Abstract
      • 1 Introduction
      • 2 Particle Removal Mechanism
      • 3 Process and Tool Kinematics
      • 4 Consumables
      • 5 Related Issues
      • 6 Summary
      • Appendix: Application of Tribology to Post-CMP Brush Scrubbing
      • References
    • Chapter 5. Contamination Removal From UV and EUV Photomasks
      • Abstract
      • 1 Introduction
      • 2 Effect of Photomask Contamination on Lithography Process
      • 3 Haze Effect on Photomask Surface
      • 4 The Particle Removal Process
      • 5 Organics Removal
      • 6 EUVL Mask Cleaning
      • 7 Summary
      • References
    • Chapter 6. Aqueous Displacement of Water-Immiscible Cleaning Solvents: Cleaning Enhancement Using Ultrasonics
      • Abstract
      • 1 Background
      • 2 The Aqueous Displacement Solution Process
      • 3 ADS Cleaning Process Requirements and Parameters
      • 4 Drying
      • 5 Evaluation for Hydrophilicity and Wettability
      • 6 Results of Displacement Tests
      • 7 Cleanliness Evaluation Tests
      • 8 Summary
      • Acknowledgements
      • References
    • Index

Product details

  • No. of pages: 212
  • Language: English
  • Copyright: © William Andrew 2016
  • Published: November 4, 2016
  • Imprint: William Andrew
  • Hardcover ISBN: 9780323431576
  • eBook ISBN: 9780323431729

About the Authors

Rajiv Kohli

Dr. Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware, as well as for unmanned spacecraft. His technical interests are in particle behavior, precision cleaning, solution and surface chemistry, advanced materials and chemical thermodynamics. Dr. Kohli was involved in developing solvent-based cleaning applications for use in the nuclear industry and he also developed an innovative microabrasive system for a wide variety of precision cleaning and micro-processing applications in the commercial industry. He is the senior editor of this book series “Developments in Surface Contamination and Cleaning”; the first ten volumes in the series were published in 2008, 2010, 2011, 2012, 2013 (Volumes 5 and 6), 2015 (Volumes 7 and 8), and 2017 (Volumes 9 and 10), respectively. The second edition of Volume 1 was published in 2016. Volume 11 and Volume 12 (this volume) are expected to be published in 2019. Previously, Dr. Kohli co-authored the book “Commercial Utilization of Space: An International Comparison of Framework Conditions”, and he has published more than 270 technical papers, articles and reports on precision cleaning, advanced materials, chemical thermodynamics, environmental degradation of materials, and technical and economic assessment of emerging technologies. Dr. Kohli was recognized for his contributions to NASA’s Space Shuttle Return to Flight effort with the Public Service Medal, one of the agency’s highest awards.

Affiliations and Expertise

National Aeronautics and Space Administration, Houston, TX, USA

Kashmiri L. Mittal

Dr. Kashmiri (Kash) Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of more than 130 published books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003. Currently, he is teaching and consulting in the areas of surface contamination and cleaning and in adhesion science and technology.

Affiliations and Expertise

Editor, Reviews of Adhesion and Adhesives, USA

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