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Chemical Vapor Deposition - 1st Edition - ISBN: 9780123496706, 9780080918723

Chemical Vapor Deposition

1st Edition

Principles and Applications

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Editors: M. Hitchman K. Jensen
Hardcover ISBN: 9780123496706
eBook ISBN: 9780080918723
Imprint: Academic Press
Published Date: 26th January 1993
Page Count: 677
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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.


Postgraduates, researchers, and practitioners in the fields of solid state physics and chemistry, microelectronics, materials science, optics, and electronic engineering.

Table of Contents

M.L. Hitchman and K.F. Jensen, Chemical Vapour Deposition--An Overview. K.F. Jensen, Fundamentals of Chemical Vapour Deposition. W.G. Breiland and P. Ho, Analysis of Chemical Vapor Deposition Processes. M.L. Hitchman and K.F. Jensen, Chemical Vapor Deposition at Low Pressures. B.S. Meyerson, Silicon Epitaxy by Chemical Vapor Deposition. R.L. Moon and Y.-M. Houng, Organometallic Vapor Phase Epitaxy of III-V Materials. D.W. Hess and D.B. Graves, Plasma-Assisted Chemical and Vapor Deposition. V.R. McCrary and V.M. Donnelly, Photo-Assisted Chemical Vapor Deposition. W.B. Jackson, Electronic and Optical Characterization of Chemical Vapor Deposition Films for Device Applications. G. Wahl, Protective Coatings. Index.


No. of pages:
© Academic Press 1993
26th January 1993
Academic Press
Hardcover ISBN:
eBook ISBN:

About the Editors

M. Hitchman

Affiliations and Expertise

University of Strathclyde

K. Jensen

Affiliations and Expertise

Massachusetts Institute of Technology

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