Advances in Imaging and Electron Physics, Volume 102

1st Edition

Serial Editors: Tom Mulvey Benjamin Kazan
Editor-in-Chiefs: Peter Hawkes
Hardcover ISBN: 9780120147441
eBook ISBN: 9780080577685
Imprint: Academic Press
Published Date: 8th September 1997
Page Count: 330
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Table of Contents

Contributors. Preface. R. Albanese and G. Rubinacci, Finite Element Methods for the Solution of 3D Eddy Current Problems: Introduction. Field Equations and Material Properties. Fields, Potentials, and Gauges. Edge Elements for 3D Field Problems. Integral Formulations for Linear and Nonlinear Eddy Currents. Differential Formulations and Constitutive Error Approach. Discussion and Conclusions. Acknowledgments. References. W. Chen and H. Ahmed, Nanofabricationfor Electronics: Introduction. Nanofabrication Methods. Pattern Transfer. Resolution Limit of Organic Resists. Applications of Nanostructures. References. A.D. Feinerman and D.A. Crewe, Miniature Electron Optics: Introduction. Scaling Lawsfor Electrostatic Lenses. Review. Fabrication of Miniature Magnetostatic Lenses. Electron Source. Detector. Electron Optical Calculations. Performance of a Stacked Einzel Lens. Summary and Future Prospects. References. S.A. Nepijko and N.N. Sedov,Aspects of Mirror Electron Microscopy: Introduction. Resolution of Mirror Electron Microscope. Distortion of Details of Object Image Under Observation in Mirror Electron Microscope. Limiting Sensitivity of Mirror Electron Microscope under Observation of Steps on Object. Image of Islands on Object Surfaces in Mirror Electron Microscope. Calculation of Image Contrast in Mirror Electron Microscope in the Focused Operation Mode. Conclusions. Acknowledgment. References. Subject Index.


Description

Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Readership

Researchers in electrical engineering, optical science and technology, materials science, image processing, and mechanical engineering.


Details

No. of pages:
330
Language:
English
Copyright:
© Academic Press 1998
Published:
Imprint:
Academic Press
eBook ISBN:
9780080577685
Hardcover ISBN:
9780120147441

Reviews

@qu:"Editing by P.W. Hawkes is immaculate and the production, in the usual style of Advances in Electronics and Electron Physics, results in a volume that will be a handsome addition to any bookshelf." @source:--MRS BULLETIN @qu:"With the accelerating pace of research and development in so many areas of microscopy, keeping abreast of the widespread literature is becoming increasingly time-consuming. In Advances in Optical and Electron Microscopy the Editors are to be congratulated on bringing together in a convenient and comprehensible form a variety of topics of current interest." @source:--J.A. Chapman in LABORATORY PRACTICE


About the Serial Editors

Tom Mulvey Serial Editor

Affiliations and Expertise

Aston University, Department of Electronic Engineering and Applied Physics, U.K.

Benjamin Kazan Serial Editor

Affiliations and Expertise

Xerox Corporation, Palo Alto, California, U.S.A.

About the Editor-in-Chiefs

Peter Hawkes Editor-in-Chief

Peter Hawkes graduated from the University of Cambridge and subsequently obtained his PhD in the Electron Microscopy Section of the Cavendish Laboratory. He remained there for several years, working on electron optics and digital image processing before taking up a research position in the CNRS Laboratory of Electron Optics (now CEMES-CNRS) in Toulouse, of which he was Director in 1987. During the Cambridge years, he was a Research Fellow of Peterhouse and a Senior Research fellow of Churchill College. He has published extensively, both books and scientific journal articles, and is a member of the editorial boards of Ultramicroscopy and the Journal of Microscopy. He was the founder-president of the European Microscopy Society, CNRS Silver Medallist in 1983 and is a Fellow of the Optical Society of America and of the Microscopy Society of America (Distinguished Scientist, Physics, 2015), Fellow of the Royal Microscopical Society and Honorary Member of the French Microscopy Society. In 1982, he was awarded the ScD degree by the University of Cambridge. In 1982, he took over editorship of the Advances in Electronics & Electron Physics (now Advances in Imaging & Electron Physics) from Claire Marton (widow of the first editor, Bill Marton) and followed Marton's example in maintaining a wide range of subject matter. He added mathematical morphology to the topics regularly covered; Jean Serra and Gerhard Ritter are among those who have contributed. In 1980, he joined Professor Wollnik (Giessen University) and Karl Brown (SLAC) in organising the first international conference on charged-particle optics, designed to bring together opticians from the worlds of electron optics, accelerator optics and spectrometer optics. This was so successful that similar meetings have been held at four-year intervals from 1986 to the present day. Peter Hawkes organised the 1990 meeting in Toulouse and has been a member of the organising committee of all the meetings. He has also partic

Affiliations and Expertise

Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique (CEMES), Toulouse, France