Dept. of Chemical Engineering, University of Washington, Box 351750, Seattle, WA 98195-1750, USA, Fax: 206 543 3451, Tel: 206-543-8786, Email: ricker@u.washington.edu
Reviews Editor
F. J. Doyle
Dept. of Chemical Engineering, University of California, Mail Code 5080, Santa Barbara, CA 93106, USA, Email: doyle@engineering.ucsb.edu
Associate Editor
Y. Arkun
Istanbul, Turkey
J. Bao
University of New South Wales, Edinburgh, UK
D. Bonvin
Laboratoire d' Automatique, Lausanne, Switzerland
R. Braatz
University of Illinois at Urbana-Champaign, Urbana, IL, USA
M-S. Chiu
National University of Singapore (NUS), Singapore
B.J. Cott
Shell Global Solutions, Houston, TX, USA
S. Engell
Technische Universität Dortmund, Dortmund, Germany
F. Forbes
University of Alberta, Edmonton, AB, Canada
B. Foss
Norwegian University of Science & Technology (NTNU), Trondheim, Norway
F. Gao
Hong Kong University of Science & Technology, Kowloon, Hong Kong
S. Hasebe
Kyoto University, Kyoto, Japan
M.A. Henson
University of Massachusetts at Amherst, Amherst, MA, USA
A. Horch
ABB Corporate Research, Ladenburg, Germany
R. King
Technische Universität Berlin (TUB), Berlin, Germany
J. Lee
Georgia Institute of Technology, Atlanta, GA, USA
G. Pannocchia
Università di Pisa, Pisa, Italy
S. Qin
University of Southern California (USC), Los Angeles, CA, USA
C. Scali
Università di Pisa, Pisa, Italy
N. Thornhill
Imperial College, London, England, UK
D. Wilson
Auckland University of Technology, Auckland, New Zealand
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