Principles, Deposition, Film Modification and Synthesis To order this title, and for more information, click here
By Jerome J. Cuomo Stephen M. Haber Harold R. Kaufman
Description Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin
film form, and the modification of the properties of thin films.
Audience
Engineers, technicians, and plant personnel in the semiconductor and related industries.
Contents 1. Perspective on Past, Present and Future Uses of Ion Beam Technology
1.1 Introduction
1.2 Past Technology
1.3 Present Capabilities
1.4 Future Trends
1.5 References
Part I. Ion Beam Technology
2. Gridded Broad-beam Ion Sources
2.1 Introduction
2.2 General Description
2.3 Discharge Chamber
2.4 Ion Optics
2.5 Production Applications
2.6 Target Contamination
2.7 Concluding Remarks
2.8 References
3. ECR Ion Sources
3.1 Introduction
3.2 Theory of Operation
3.3 Types of Sources and Characteristics
3.4 Etching
3.5 Deposition
3.6 References
4. Hall Effect Ion Sources
4.1 Introduction
4.2 End-hall Ion Source
4.3 Closed Drift Ion Source
4.4 Concluding
Remarks
4.5 References
5. Ionized Cluster Beam (ICB) Deposition and Epitaxy
5.1 Introduction
5.2 Experiment
5.3 Aspects of Film
Deposition with ICB
5.4 Summary
5.5 References
Part II. Sputtering Phenomena
6. Quantitative Sputtering
6.1 Introduction
6.2
Total Sputter Yield Considerations
6.3 Differential Sputter Yield Considerations
6.4 Experimental Considerations for Sputter Yield
Measurements
6.5 Total Sputter Yield Measurements
6.6 Differential Yield Measurements: Angular and Energy Distributions
6.7 Concluding
Remarks
6.8 References
7. Laser-induced Fluorescence as a Tool for the Study of Ion Beam Sputtering
7.1 Introduction
7.2 Experimental
Technique
7.3 Summary of Data
7.4 Conclusion
7.5 References
8. Characterization of Atoms Desorbed from Surfaces by Ion Bombardment
Using Multiphoton Ionization Detection
8.1 Introduction
8.2 Analytical Applications
8.3 Energy and Angle Measurements
8.4 Nonresonant
Multiphoton lonization
8.5 Conclusion
8.6 References
9. The Application of Postionization for Sputtering Studies and Surface or
Thin Film Analysis
9.1 Introduction
9.2 Postionization Techniques Using Penning Processes
9.3 Electron Gas Postionization in Low
Pressure Plasmas
9.4 Summary
9.5 References
Part III. Film Modification and Synthesis
10. The Modification of Films by Ion Bombardment
10.1 Introduction
10.2 Experimental Concerns for Bombardment-modification of Films
10.3 Effects on Film Properties by Energetic
Bombardment
10.4 Reactive Film Deposition
10.5 Summary
10.6 References
11. Control of Film Properties by Ion-assisted Deposition
Using Broad Beam Sources
11.1 Introduction
11.2 Property Changes
11.3 Film Structure Modification
11.4 General Discussion of
Ion Bombardment Mechanisms
11.5 References
12. Etching with Directed Beams
12.1 Introduction
12.2 Ion Beam Assisted Etching
12.3
Etching GaAs
12.4 Etching Diamond
12.5 Hot Jet Etching
12.6 Etching Damage
12.7 Summary
12.8 References
13. Film Growth Modification
by Concurrent Ion Bombardment: Theory and Simulation
13.1 Introduction
13.2 Film Microstructure, the Role of Impact Mobility and
Substrate Temperature
13.3 Ion Bombardment Induced Structural Modifications during Film Growth
13.6 Conclusions
13.7 References
14. Interface Structure and Thin Film Adhesion
14.1 Introduction
14.2 Factors Affecting Adhesion
14.3 Ion Beam Techniques
14.4
Interface Stitching
14.5 Low Energy Ion Sputtering
14.6 Implantation and Adsorption
14.7 Ion Assisted Deposition
14.8 Summary
14.9 References
15. Modification of Thin Films by Off-normal Incidence Ion Bombardment
15.1 Introduction
15.2 Modification of Crystal
Structure by Off-normal Incidence Ion Bombardment
15.3 Topography Changes Induced by Off-normal Incidence Ion Bombardment
15.4 Summary
15.5 References
16. Ion Beam Interactions with Polymer Surfaces
16.1 Introduction
16.2 High and Medium Energy Ions
16.3 SIMS
Studies of Polymers
16.4 XPS Studies
16.5 Summary
16.6 References
17. Topography: Texturing Effects
17.1 Introduction
17.2
Ion Beam Sputter Texturing Processes and Effects
17.3 Textured Surface Properties
17.4 References
18. Methods and Techniques of Ion
Beam Processes
18.1 Introduction
18.2 Ion Beam Sputtering (IBS)
18.3 Ion Beam Sputter Deposition
18.4 Ion Beam Assisted Deposition
(IBAD)
18.5 Dual Ion Beam Sputtering (DIBS)
18.6 Ion Assisted Bombardment: Other Techniques
18.7 Summary
18.8 References
19.
Ion-assisted Dielectric and Optical Coatings
19.1 Introduction
19.2 Microstructure of Thin Films
19.3 Effects of Ion Bombardment
on Film Properties
19.4 Ion-assisted Techniques
19.5 Optical Properties of Ion-assisted Films
19.6 Conclusion
19.7 References
20. Diamond and Diamond-like Thin Films by Ion Beam Techniques
20.1 Introduction
20.2 Principle of Diamond Synthesis
20.3 Experimental
Techniques
20.4 Diamond-like Films
20.5 Diamond Particles
20.6 Conclusion
20.7 References
Index
Bibliographic details
Hardbound, 456 pages, publication date: DEC-1989
ISBN-13: 978-0-8155-1199-1
ISBN-10: 0-8155-1199-X
Imprint: WILLIAM ANDREW
Price and Ordering
Price: GBP 108.99 USD 180 EUR 128.95
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