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| MATERIALS SCIENCE OF THIN FILMS
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Second Edition
By
Milton Ohring, Stevens Institute of Technology, NJ, U.S.A.
Description
This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring
has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials
and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced
undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview
of the field.
Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard
to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have
been greatly updated, and several new chapters have been added.
Audience
Advanced undergraduate and first-year graduate students in materials science and electrical engineering; researchers in industrial in-house courses, or short courses offered by professional societies.
Contents
Foreword to First Edition
Preface
Acknowledgments
A Historical Perspective
Chapter 1 A Review of Materials Science
1.1. Introduction
1.2. Structure
1.3. Defects in Solids
1.4. Bonds and Bands in Materials
1.5. Thermodynamics of Materials
1.6. Kinetics
1.7. Nucleation
1.8. An Introduction to Mechanical Behavior
1.9. Conclusion
Exercises
References
Chapter 2 Vacuum Science and Technology
2.1. Introduction
2.2. Kinetic Theory of Gases
2.3. Gas Transport and Pumping
2.4. Vacuum Pumps
2.5. Vacuum Systems
2.6. Conclusion
Exercises
References
Chapter 3 Thin-Film Evaporation Processes
3.1. Introduction
3.2. The Physics and Chemistry of Evaporation
3.3. Film Thickness Uniformity
and Purity
3.4. Evaporation Hardware
3.5. Evaporation Processes and Applications
3.6. Conclusion
Exercises
References
Chapter 4 Discharges,
Plasmas, and Ion-Surface Interactions
4.1. Introduction
4.2. Plasmas, Discharges, and Arcs
4.3. Fundamentals of Plasma Physics
4.4.
Reactions in Plasmas
4.5. Physics of Sputtering
4.6. Ion Bombardment Modification of Growing Films
4.7. Conclusion
Exercises
References
Chapter 5 Plasma and Ion Beam Processing of Thin Films
5.1. Introduction
5.2. DC, AC, and Reactive Sputtering Processes
5.3. Magnetron
Sputtering
5.4. Plasma Etching
5.5. Hybrid and Modified PVD Processes
5.6. Conclusion
Exercises
References
Chapter 6 Chemical Vapor
Deposition
6.1. Introduction
6.2. Reaction Types
6.3. Thermodynamics of CVD
6.4. Gas Transport
6.5. Film Growth Kinetics
6.6. Thermal
CVD Processes
6.7. Plasma-Enhanced CVD Processes
6.8. Some CVD Materials Issues
6.9. Safety
6.10. Conclusion
Exercises
References
Chapter 7 Substrate Surfaces and Thin-Film Nucleation
7.1. Introduction
7.2. An Atomic View of Substrate Surfaces
7.3. Thermodynamic
Aspects of Nucleation
7.4. Kinetic Processes in Nucleation and Growth
7.5. Experimental Studies of Nucleation and Growth
7.6. Conclusion
Exercises
References
Chapter 8 Epitaxy
8.1. Introduction
8.2. Manifestations of Epitaxy
8.3. Lattice Misfit and Defects in Epitaxial
Films
8.4. Epitaxy of Compound Semiconductors
8.5. High-Temperature Methods for Depositing Epitaxial Semiconductor Films
8.6. Low-Temperature
Methods for Depositing Epitaxial Semiconductor Films
8.7. Mechanisms and Characterization of Epitaxial Film Growth
8.8. Conclusion
Exercises
References
Chapter 9 Film Structure
9.1. Introduction
9.2. Structural Morphology of Deposited Films and Coatings
9.3. Computational
Simulations of Film Structure
9.4. Grain Growth, Texture, and Microstructure Control in Thin Films
9.5. Constrained Film Structures
9.6.
Amorphous Thin Films
9.7. Conclusion
Exercises
References
Chapter 10 Characterization of Thin Films and Surfaces
10.1. Introduction
10.2. Film Thickness
10.3. Structural Characterization of Films and Surfaces
10.4. Chemical Characterization of Surfaces and Films
10.5.
Conclusion
Exercises
References
Chapter 11 Interdiffusion, Reactions, and Transformations in Thin Films
11.1. Introduction
11.2. Fundamentals
of Diffusion
11.3. Interdiffusion in Thin Metal Films
11.4. Compound Formation and Phase Transformations in Thin Films
11.5. Metal-Semiconductor
Reactions
11.6. Mass Transport in Thin Films under Large Driving Forces
11.7. Conclusion
Exercises
References
Chapter 12 Mechanical Properties
of Thin Films
12.1. Introduction
12.2. Mechanical Testing and Strength of Thin Films
12.3. Analysis of Internal Stress
12.4. Techniques
for Measuring Internal Stress in Films
12.5. Internal Stresses in Thin Films and Their Causes
12.6. Mechanical Relaxation Effects in
Stressed Films
12.7. Adhesion
12.8. Conclusion
Exercises
References
Index
| Bibliographic details |
Hardbound, 794 pages, publication date: OCT-2001
ISBN-13: 978-0-12-524975-1
ISBN-10: 0-12-524975-6
Imprint: ACADEMIC PRESS
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Last update: 12 Jun 2009
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