Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

By
John E.J. Schmitz, Philips Semiconductor; former COO of SEMATECH

Description
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Audience:
Engineers and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, filter and other industries.