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| ADVANCES IN IMAGING AND ELECTRON PHYSICS, 143
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By
Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France
Included in series
Advances in Imaging and Electron Physics,
Description
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in
Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor
devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave
propagation, electron microscopy, and the computing methods used in all these domains.
Audience
Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.
Contents
Electron-Beam-Induced Nanometer-Scale Deposition (C.W. Hagen, N. Silvis-Cividjian).
Introduction.
Electron-Beam-Induced Deposition:
A Literature Survey.
The Theory of EBID Spatial Resolution.
The Role of Secondary Electrons in EBID.
Delocalization Effects
in EBID.
Conclusions.
References.
Index.
| Bibliographic details |
Hardbound, 264 pages, publication date: SEP-2006
ISBN-13: 978-0-12-014785-4
ISBN-10: 0-12-014785-8
Imprint: ACADEMIC PRESS
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| Price and Ordering |
Price:
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GBP 129.99
EUR 153.95
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Last update: 3 Oct 2009
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