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LASER CRYSTALLIZATION OF SILICON - FUNDAMENTALS TO DEVICES, 75
Laser Crystallization of Silicon - Fundamentals to Devices, 75
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By
Norbert Nickel, Hahn-Meitner-Institut, Berlin, Germany

Included in series
Semiconductors and Semimetals,

Description
This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.

Audience
Academic and Industrial researchers across all disciplines involved in the study of semiconductors and semimetals.

Contents
Preface; introduction to laser crystallization of silicon; heat transfer and phase transformations in laser melting and recrystallization of amorphous thin si films; modelling laser-induced phase change processes: theory and computation; laser interference crystallization of amorphous films; structural and electronic properties of laser crystallized poly-si.

Bibliographic details
Hardbound, 204 pages, publication date: DEC-2003
ISBN-13: 978-0-12-752184-8
ISBN-10: 0-12-752184-4
Imprint: ACADEMIC PRESS

Price and Ordering
Price:
USD 215
GBP 129.99
EUR 153.95
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Last update: 7 Sep 2009
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