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| THIN-FILM DIAMOND I, 76
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(part of the Semiconductors and Semimetals Series)
To order this title, and for more information, click here
Edited By
Christopher Nebel, Technische Universitat Munchen, Germany
Juergen Ristein, Institut fur Technische Physik II, Erlangen, Germany
Included in series
Semiconductors and Semimetals,
Description
This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the
material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically
inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency
devices.
Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results
regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties
in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices.
Audience
Scientists working in the field of semi-conductor research and technology.
Contents
Textured and Heteroepitaxial CVD Diamond Films; Structural Imperfections in CVD Diamond Films; Doping Diamond by Ion-Implantation; Boron
Doping of Diamond Films from the Gas Phase; n-Type Diamond Growth; Transport and Defect Properties of Intrinsic and
Boron-Doped Diamond;
Optical Properties of CVD Diamond; Luminescence from Optical Defects and Impurities in CVD Diamond
| Bibliographic details |
Hardbound, 480 pages, publication date: DEC-2003
ISBN-13: 978-0-12-752185-5
ISBN-10: 0-12-752185-2
Imprint: ACADEMIC PRESS
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| Price and Ordering |
Price:
USD 215
GBP 129.99
EUR 153.95
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Last update: 4 Sep 2009
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