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An Introduction
To order this title, and for more information, click here
Edited By
Dennis Manos, Princeton University, New Jersey
Daniel Flamm, AT&T Bell Laboratories, Murray Hill, New Jersey
Description
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate
students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms.
Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
Audience
Scientists and engineers who work with plasma in microelectronics, fusion, and space technology; graduate students in these areas.
Contents
D.L. Flamm and G.K. Herb, Plasma Etching Technology. An Overview. D.L. Flamm, Introduction to Plasma Chemistry. S.A.
Cohen, An Introduction to Plasma Physics for Materials Processing. D.M. Manos and H.F. Dylla, Diagnostics of Plasmas for
Materials Processing. A.R. Reinberg, Plasma Etch Equipment and Technology. J.M.E. Harper, Ion Beam Etching. G.K.
Herb, Safety, Health, and Engineering Considerations for Plasma Processing.
| Bibliographic details |
Hardbound, 476 pages, publication date: JUL-1989
ISBN-13: 978-0-12-469370-8
ISBN-10: 0-12-469370-9
Imprint: ACADEMIC PRESS
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| Price and Ordering |
Price:
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USD 165
EUR 129.95
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Last update: 4 Sep 2009
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