Edited by
Dennis Manos, Princeton University, New Jersey
Daniel Flamm, AT&T Bell Laboratories, Murray Hill, New Jersey
Description
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate
students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms.
Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
Audience:
Scientists and engineers who work with plasma in microelectronics, fusion, and space technology; graduate students in these areas.
