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PLASMA ETCHING
Plasma Etching
An Introduction
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Edited By
Dennis Manos, Princeton University, New Jersey
Daniel Flamm, AT&T Bell Laboratories, Murray Hill, New Jersey

Description
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

Audience
Scientists and engineers who work with plasma in microelectronics, fusion, and space technology; graduate students in these areas.

Contents
D.L. Flamm and G.K. Herb, Plasma Etching Technology. An Overview. D.L. Flamm, Introduction to Plasma Chemistry. S.A. Cohen, An Introduction to Plasma Physics for Materials Processing. D.M. Manos and H.F. Dylla, Diagnostics of Plasmas for Materials Processing. A.R. Reinberg, Plasma Etch Equipment and Technology. J.M.E. Harper, Ion Beam Etching. G.K. Herb, Safety, Health, and Engineering Considerations for Plasma Processing.

Bibliographic details
Hardbound, 476 pages, publication date: JUL-1989
ISBN-13: 978-0-12-469370-8
ISBN-10: 0-12-469370-9
Imprint: ACADEMIC PRESS

Price and Ordering
Price:
GBP 110
USD 165
EUR 129.95
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Last update: 4 Sep 2009
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