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| AUTHOR AND SUBJECT CUMULATIVE INDEX, INCLUDING TABLES OF CONTENTS VOLUMES 1-24, 25
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Subject and Author Cumulative Index, Volumes 1-24
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Ronald Powell, Novellus Systems, Inc., Palo Alto, California
Maurice Francombe, Georgia State University, Atlanta, U.S.A.
Abraham Ulman, Polytechnic University, Brooklyn, New York, U.S.A.
Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes
since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to
reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved
beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both
their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title
has been slightly modified from Physics of Thin Films to Thin Films.
Audience
Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.
Contents
Subject and Author Cumulative Index, Volumes 1-24.
| Bibliographic details |
Hardbound, 526 pages, publication date: JUN-1998
ISBN-13: 978-0-12-533025-1
ISBN-10: 0-12-533025-1
Imprint: ACADEMIC PRESS
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| Price and Ordering |
Price:
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GBP 134.99
EUR 158.95
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Last update: 3 Oct 2009
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