Edited by
M. Hitchman, University of Strathclyde
K. Jensen, Massachusetts Institute of Technology
Description
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition
(CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles
and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Audience:
Postgraduates, researchers, and practitioners in the fields of solid state physics and chemistry, microelectronics, materials science, optics, and electronic engineering.
