By
Hugh O. Pierson, Sandia National Laboratories (retired)
Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology
has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably.
The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The
second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors
in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance
of CVD in production of semiconductor and related applications.
Audience:
Completely up-to-date look at the entire chemical vapor deposition process, for engineers and technologists in the semiconductor, optoelectronic,
optics, cutting tool, refractory fibers, filter and other industries.
