Advances in Research and Development

Modeling of Film Deposition for Microelectronic Applications

Advances in Research and Development on ScienceDirect(Opens new window)
Hardbound, 311 Pages
Published: SEP-1997
ISBN 10: 0-12-533023-5
ISBN 13: 978-0-12-533023-7
Imprint: ACADEMIC PRESS


Series Editor:
Maurice Francombe, Georgia State University, Atlanta, U.S.A.
John Vossen, RCA Laboratories, Princeton, New Jersey

Description
Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

Audience:
Researchers in thin films, materials science, condensed matter physics, AVS, microelectronics, and computer simulation in this field.


 
Last update: 14 Jan 2012