Series Editor:
Ronald Powell, Novellus Systems, Inc., Palo Alto, California
Maurice Francombe, Georgia State University, Atlanta, U.S.A.
Abraham Ulman, Polytechnic University, Brooklyn, New York, U.S.A.
Janet Perlman, Southwest Indexing
Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes
since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to
reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved
beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both
their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title
has been slightly modified from
Physics of Thin Films to
Thin Films.
Audience:
Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.
