Advances in Research and Development: Plasma Sources for Thin Film Deposition and Etching

Series Editor:
Maurice Francombe, Georgia State University, Atlanta, U.S.A.
John Vossen, RCA Laboratories, Princeton, New Jersey

Description
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Audience:
Libraries, researchers in electrical engineering, condensed matter physics, and materials science departments. All academic and industrial thin film researchers.