Edited by
Georg Müller, University Erlangen-Nuerenberg, Erlangen, Germany
Jean-Jacques Métois, Centre de Recherche de la Matière Condensée et des Nanosciences, Marseille, France
Peter Rudolph, Institut für Kristallzüchtung, Berlin, Germany
Description
The book contains 5 chapters with 19 contributions form internationally well acknowledged experts in various fields of crystal growth.
The topics are ranging from fundamentals (thermodynamic of epitaxy growth, kinetics, morphology, modeling) to new crystal materials (carbon
nanocrystals and nanotubes, biological crystals), to technology (Silicon Czochralski growth, oxide growth, III-IV epitaxy) and characterization
(point defects, X-ray imaging, in-situ STM). It covers the treatment of bulk growth as well as epitaxy by anorganic and organic materials.
Audience:
Universities for science and technology, research institutes, physicists and chemists in the electronic industry.
