Editor-in-Chief

  • N. Cross

    Dept. of Design, Fac. of Mathematics, Computing & Technology, Open University, Milton Keynes, UK

    Email N. Cross

Associate Editors

  • P. Lloyd

    The Open University, Milton Keynes, England, UK

  • R. Oxman

    Technion - Israel Institute of Technology, Haifa, Israel

  • N. Roozenburg

    Delft University of Technology, Delft, Netherlands

  • J. Cagan

    Carnegie Mellon University, Pittsburgh, PA, USA

Editorial Board

  • Ö. Akin

    Carnegie Mellon University, Pittsburgh, PA, USA

  • C. Atman

    University of Washington, Seattle, WA, USA

  • P. Badke-Schaub

    Delft University of Technology, Delft, Netherlands

  • L. Ball

    University of Central Lancashire, Preston, UK

  • T. Bhamra

    Loughborough University, England, UK

  • N. Crilly

    University of Cambridge, Cambridge, England, UK

  • A. Dong

    University of Sydney, Sydney, NSW, Australia

  • K. Dorst

    University of Technology Sydney, Broadway, NSW, Australia

  • D. Durling

    Hinstock, Market Drayton, UK

  • S. D. Eppinger

    Massachusetts Institute of Technology (MIT), Cambridge, MA, USA

  • K. Friedman

    Swinburne University of Technology, Victoria, Australia

  • P. Galle

    The Royal Danish Academy of Fine Arts, Copenhagen, Denmark

  • S.-W. Hsiao

    National Cheng Kung University, Tainan, Taiwan, ROC

  • L. Justice

    Rochester Institute of Technology, Rochester, NY, USA

  • T. Kvan

    University of Melbourne, Victoria, Australia

  • J. Z. Langrish

    Moor, Stockport, UK

  • B. Lawson

    University of Sheffield, Sheffield, England, UK

  • K.-P. Lee

    Korea Advanced Institute of Science and Technology (KAIST), Yuseong-Gu, Daejeon, South Korea

  • L. Leifer

    Stanford University, Stanford, CA, USA

  • U. Lindemann

    Technische Universität München, Garching, Germany

  • R. Luck

    University of Reading, Reading, UK

  • P. Rodgers

    Northumbria University, Newcastle Upon Tyne, UK

  • S. Roworth-Stokes

    University for the Creative Arts,

  • C. Rust

    Sheffield Hallam University, Sheffield, UK

  • K. Sato

    Illinois Institute of Technology, Chicago, IL, USA

  • W. P. Seering

    Massachusetts Institute of Technology (MIT), Cambridge, MA, USA

  • E. Stolterman

    Indiana University, Bloomington, IN, USA

  • M. Tovey

    Coventry University, Coventry, UK

  • D. Ullman

    Design & Decision Support, Corvallis, OR, USA

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