Thin Film Processes, 1
- John Vossen, RCA Laboratories, Princeton, New Jersey
Advanced undergraduate, and graduate students studying chemistry.
- Published: December 1978
- Imprint: ACADEMIC PRESS
- ISBN: 978-0-12-728250-3
Table of ContentsIntroduction. J.L. Vossen, Physical Methods of Film Deposition. J.L. Vossen and J.J. Cuomo, Glow Discharge Sputter Deposition. J.A. Thornton and A.S. Penfold, Cylindrical Magnetron Sputtering. D.B. Fraser, The Sputter and S-Gun Magnetrons. R.K. Waits, Planar Magnetron Sputtering. J.M.E. Harper, Ion Beam Deposition. Chemical Methods of Film Deposition. F.A. Lowenheim, Deposition of Inorganic Films from Solution. W. Kern and V.S. Ban, Chemical Vapor Deposition of Inorganic Thin Films. Physical-Chemical Methods of Film Deposition J.R. Hollahan and R.S. Rosler, Plasma Deposition of Inorganic Thin Films. H. Yasuda, Glow Discharge Polymerization. Etching Processes. W. Kern and C.A. Deckert, Chemical Etching. C.M. Melliar-Smith and C.J. Mogab, Plasma-Assisted Etching Techniques for Pattern Delineation. References. Index.