Silicon-Based Material and Devices, Two-Volume Set

Materials and Processing, Properties and Devices

Edited by

  • Hari Nalwa, Formerly of Hitachi Research Laboratory, Japan

This book covers a broad spectrum of the silicon-based materials and their device applications. This book provides a broad coverage of the silicon-based materials including different kinds of silicon-related materials, their processing, spectroscopic characterization, physical properties, and device applications.This two-volume set offers a selection of timely topics on silicon materials namely those that have been extensively used for applications in electronic and photonic technologies. The extensive reference provides broad coverage of silicon-based materials, including different types of silicon-related materials, their processing, spectroscopic characterization, physical properties, and device applications. Fourteen chapters review the state of the art research on silicon-based materials and their applications to devices. This reference contains a subset of articles published in AP's recently released Handbook of Advanced Electronic and Photonic Materials and Devices ( 2000, ISBN 012-5137451, ten volumes) by Dr. Hari Nalwa. This two-volume work strives to present a highly coherent coverage of silicon-based material uses in the vastly dynamic arena of silicon chip research and technology.
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Audience

This book is aimed for the scientists and upper level graduate students working in solid state physics, materials science, optical engineering and photophysics, electrical and electronic engineering, liquic crystals displays, information technology and semiconductor industries.

 

Book information

  • Published:
  • Imprint: ACADEMIC PRESS
  • ISBN: 978-0-12-513909-0


Table of Contents

Volume 1Optical, Structural, And Electrical Properties of Amorphous Silicon Carbide Films (W. K. Choi)Silicon Carbon Nitride: A New Wideband Gap Material (L. C. Chen, K. H. Chen, J-J. Wu, D. M. Bhusari, and M. C. Lin)Amorphous Silica (Minoru Tomozawa)Gas Phase and Surface Kinetics of Silicon Chemical Vapor Deposition from Silane and Chlorosilanes (Maurizio Masi, Carlo Cavallotti, and Sergio Carra)Growth, Characterization, and Physical Properties of Non-Crystalline and Nanostructured Silicon-Based Alloys (F. Giorgis and C. F. Pirri)Photonic and Magnetic Properties of Spark-Processed Silicon (R. E. Hummel)Wet-Chemical Conditioning of Silicon: Electronic Properties Correlated with the Surface Morphology (H. Angermann, W. Henrion, and A. Roseler)IndexVolume 2Optical Absorption, Luminescence, and ESR Spectral Properties of Point Defects in Silica (M. Leone, S. Agnello, R. Boscaino, M. Cannas, and F. M. Gelardi)The Refractive Index of Silica Glass and Its Dependence on Pressure, Temperature, and the Wavelength of the Incident Light (C. Z. Tan and J. Arndt)Structures and Properties of Amorphous Silicon Dioxide-Issues on the Reliability and Novel Applications (Hiroyuki Nishikawa)Porous Silicon Microcavities (Claudio Vinegoni, Massimo Cazzanelli, and L. Pavesi)Polycrystalline Silicon Based Thin Film Transistors for Integrated Active-Matrix Liquid-Crystal Displays (C. A. Dimitriadis)Light Emission in Silicon (David J. Lockwood)Erbium in Silicon and Silicon-Germanium (J. H. Evans-Freeman and A. R. Peaker)Index