Plasma Sources for Thin Film Deposition and Etching

Series Editor:

  • John Vossen, RCA Laboratories, Princeton, New Jersey

Edited by

  • Maurice Francombe, Georgia State University, Atlanta, U.S.A.

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
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Audience

Libraries, researchers in electrical engineering, condensed matter physics, and materials science departments. All academic and industrial thin film researchers.

 

Book information

  • Published: August 1994
  • Imprint: ACADEMIC PRESS
  • ISBN: 978-0-12-533018-3


Contents

M.A. Lieberman and R.A. Gottscho, Design of High- Density Plasma Sources for Materials Processing. O.A. Popov, Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films. S.L. Rohde, Unbalanced Magnetron Sputtering. C. Steinbruchel, The Formation of Particles in Thin-Film Processing Plasmas. References. Author Index. Subject Index.