Particle Beam Physics, 105

  • Tom Mulvey, Aston University, Department of Electronic Engineering and Applied Physics, U.K.
    • Benjamin Kazan, Xerox Corporation, Palo Alto, California, U.S.A.
      • Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France

      Audience

      Researchers in electrical engineering, optical science and technology, materials science, image processing, and mechanical engineering.

 

Book information

  • Published: October 1998
  • Imprint: ACADEMIC PRESS
  • ISBN: 978-0-12-014747-2

Reviews

"Editing by P.W. Hawkes is immaculate and the production, in the usual style of Advances in Electronics & Electron Physics, results in a volume that will be a handsome addition to any bookshelf."
Praise for the Series, --MRS BULLETIN


"With the accelerating pace of research and development in so many areas of microscopy, keeping abreast of the widespread literature is becoming increasingly time-consuming. In Advances in Optical & Electron Microscopy the Editors are to be congratulated on bringing together in a convenient and comprehensible form a variety of topics of current interest."
--J.A. Chapman in LABORATORY PRACTICE



Table of Contents

A. Åström and R. Forchheimer, Near-Sensor Image Processing. E. Oho, Digital Image Processing Technology for Scanning Electron Microscopy. H. Suzuki, Electron Gun Systems for Color CRTs. E. Yamazaki, Design and Performance of Shadow-Mask Color CRTs. Subject Index.