Advances in Research and Development: Optical Characterization of Real Surfaces and Films, 19

Optical Characterization of Real Surfaces and Films

  • Maurice Francombe, Georgia State University, Atlanta, U.S.A.
  • John Vossen, RCA Laboratories, Princeton, New Jersey
  • K. Vedam, The Pennsylvania State University

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Audience
Libraries, researchers in electrical engineering, condensed matter physics, and materials science departments. All academic and industrial thin film researchers.

Published: November 1994

Imprint: Academic Press

Contents

  • B. Drevillon and V. Yakovlev, In Situ Studies of Crystalline Semiconductor Surfaces by Reflectance Anisotropy. R.W. Collins, I. An, H.V. Nguyen, Y. Li, and Y. Lu, Real-Time Spectroscopic Ellipsometry Studies of theNucleation, Growth, and Optical Functions of Thin Films, Part I: Tetrahedrally-Bonded Materials. H.V. Nguyen, I. An, and R. Collins, Real-Time Spectroscopic Ellipsometry Studies of the Nucleation, Growth, and Optical Functions of Thin Films, Part II: Aluminum. P. Chindaudom and K. Vedam, Optical Characterization of Inhomogeneous Transparent Films on Transparent Substrates by Spectroscopic Ellipsometry. S. Trolier-McKinstry, P. Chindaudom, K. Vedam, and R.E. Newnham, Characterization of Ferroelectric Films by Spectroscopic Ellipsometry. A.N. Parikh and D. Allara, Effects of Optical Anisotropy on Spectro-Ellipsometric Data for Thin Films and Surfaces. Chapter References. Author Index. Subject Index.

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