Materials Science of Thin Films book cover

Materials Science of Thin Films

Deposition and Structure

When Ohring’s Materials Science of Thin Films was first published in 1992, there were already at least 200 existing books on various aspects of thin film science and technology, but Ohring was quickly recognized as the first true textbook on the subject, specifically intended for senior/graduate level classroom use in universities, as well as industrial inhouse or short courses offered by professional societies. It offers the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. Partly because of that and because of the author’s engaging writing style Materials Science of Thin Films has been, and continues to be, the leading textbook in the field. The 3rd edition has been capably revised by Dr. Daniel Gall, associate professor of materials science and engineering at RPI, and Dr. Shefford Baker, associate professor of materials science and engineering at Cornell University.

Audience
Advanced undergraduate and first-year graduate students in materials science and electrical engineering; researchers in industrial in-house courses, or short courses offered by professional societies.

Hardbound, 864 Pages

Published: September 2014

Imprint: Academic Press

ISBN: 978-0-12-375666-4

Contents

  • A Historical Perspective
    Chapter 1 A Review of Materials Science
    1.1. Introduction
    1.2. Structure
    1.3. Defects in Solids
    1.4. Bonds and Bands in Materials
    1.5. Thermodynamics of Materials
    1.6. Kinetics
    1.7. Nucleation
    1.8. An Introduction to Mechanical Behavior
    1.9. Conclusion

    Chapter 2 Vacuum Science and Technology
    2.1. Introduction
    2.2. Kinetic Theory of Gases
    2.3. Gas Transport and Pumping
    2.4. Vacuum Pumps
    2.5. Vacuum Systems
    2.6. Conclusion

    Chapter 3 Thin-Film Evaporation Processes
    3.1. Introduction
    3.2. The Physics and Chemistry of Evaporation
    3.3. Film Thickness Uniformity and Purity
    3.4. Evaporation Hardware
    3.5. Evaporation Processes and Applications
    3.6. Conclusion

    Chapter 4 Discharges, Plasmas, and Ion-Surface Interactions
    4.1. Introduction
    4.2. Plasmas, Discharges, and Arcs
    4.3. Fundamentals of Plasma Physics
    4.4. Reactions in Plasmas
    4.5. Physics of Sputtering
    4.6. Ion Bombardment Modification of Growing Films
    4.7. Conclusion

    Chapter 5 Plasma and Ion Beam Processing of Thin Films
    5.1. Introduction
    5.2. DC, AC, and Reactive Sputtering Processes
    5.3. Magnetron Sputtering
    5.4. Plasma Etching
    5.5. Hybrid and Modified PVD Processes
    5.6. Conclusion

    Chapter 6 Chemical Vapor Deposition
    6.1. Introduction
    6.2. Reaction Types
    6.3. Thermodynamics of CVD
    6.4. Gas Transport
    6.5. Film Growth Kinetics
    6.6. Thermal CVD Processes
    6.7. Plasma-Enhanced CVD Processes
    6.8. Some CVD Materials Issues
    6.9. Safety
    6.10. Conclusion

    Chapter 7 Substrate Surfaces and Thin-Film Nucleation
    7.1. Introduction
    7.2. An Atomic View of Substrate Surfaces
    7.3. Thermodynamic Aspects of Nucleation
    7.4. Kinetic Processes in Nucleation and Growth
    7.5. Experimental Studies of Nucleation and Growth
    7.6. Conclusion

    Chapter 8 Epitaxy
    8.1. Introduction
    8.2. Manifestations of Epitaxy
    8.3. Lattice Misfit and Defects in Epitaxial Films
    8.4. Epitaxy of Compound Semiconductors
    8.5. High-Temperature Methods for Depositing Epitaxial Semiconductor Films
    8.6. Low-Temperature Methods for Depositing Epitaxial Semiconductor Films
    8.7. Mechanisms and Characterization of Epitaxial Film Growth
    8.8. Conclusion

    Chapter 9 Film Structure
    9.1. Introduction
    9.2. Structural Morphology of Deposited Films and Coatings
    9.3. Computational Simulations of Film Structure
    9.4. Grain Growth, Texture, and Microstructure Control in Thin Films
    9.5. Constrained Film Structures
    9.6. Amorphous Thin Films
    9.7. Conclusion

    Chapter 10 Characterization of Thin Films and Surfaces
    10.1. Introduction
    10.2. Film Thickness
    10.3. Structural Characterization of Films and Surfaces
    10.4. Chemical Characterization of Surfaces and Films
    10.5. Conclusion

    Chapter 11 Interdiffusion, Reactions, and Transformations in Thin Films
    11.1. Introduction
    11.2. Fundamentals of Diffusion
    11.3. Interdiffusion in Thin Metal Films
    11.4. Compound Formation and Phase Transformations in Thin Films
    11.5. Metal-Semiconductor Reactions
    11.6. Mass Transport in Thin Films under Large Driving Forces
    11.7. Conclusion

    Chapter 12 Mechanical Properties of Thin Films
    12.1. Introduction
    12.2. Mechanical Testing and Strength of Thin Films
    12.3. Analysis of Internal Stress
    12.4. Techniques for Measuring Internal Stress in Films
    12.5. Internal Stresses in Thin Films and Their Causes
    12.6. Mechanical Relaxation Effects in Stressed Films
    12.7. Adhesion
    12.8. Conclusion

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