Materials and Processes for Submicron Technologies
- J.M. Martinez-Duart, Fisica Aplicada, Universidad Cantoblanco, Madrid, Spain
- R. Madar, LMPG-ENSPG, Saint Martin d'Hères, France
- R.A. Levy, New Jersey Institute of Technology, Newark, NJ, USA
The European Materials Society decided to hold a Symposium entitled Materials and Processes for Submicron Technologies in June 16-19, 1998, within the yearly E-MRS Spring Meeting in Strasbourg, France.
The purpose of this meeting was to discuss the results of the advances in microelectronic devices directly relating to the reduction in size of features of the devices down to submicron size. When electronic materials are patterned to these small sizes, their physico-chemical properties show many aspects (interdiffusion, electromigration, etc.), many of these not well known yet. The articles presented in this volume, 28 in number, are representative of the 40 papers accepted for this particular E-MRS Meeting (Symposium N).
For engineers and scientists specialising in the area of Submicron Technologies.