Ionized Physical Vapor Deposition, 27

  • Ronald Powell, Novellus Systems, Inc., Palo Alto, California
    • Abraham Ulman, Polytechnic University, Brooklyn, New York

    Audience

    R&D scientists (p) in the microelectronics industry Integrated circuit process engineers (p) Materials scientists (p) Graduate students (s) in electrical engineering, materials science, applied physics, and chemistry Educators (s)

 

Book information

  • Published: October 1999
  • Imprint: ACADEMIC PRESS
  • ISBN: 978-0-12-533027-5