Ionized Physical Vapor Deposition, 27
- Ronald Powell, Novellus Systems, Inc., Palo Alto, California
- Abraham Ulman, Polytechnic University, Brooklyn, New York
Audience
R&D scientists (p) in the microelectronics industry Integrated circuit process engineers (p) Materials scientists (p) Graduate students (s) in electrical engineering, materials science, applied physics, and chemistry Educators (s)
,
Published: October 1999
Imprint: Academic Press
ISBN: 978-0-12-533027-5

