Ionized Physical Vapor Deposition, 27

  • Ronald Powell, Novellus Systems, Inc., Palo Alto, California
    • Abraham Ulman, Polytechnic University, Brooklyn, New York

    Audience
    R&D scientists (p) in the microelectronics industry Integrated circuit process engineers (p) Materials scientists (p) Graduate students (s) in electrical engineering, materials science, applied physics, and chemistry Educators (s)

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Published: October 1999

Imprint: Academic Press

ISBN: 978-0-12-533027-5

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