In Situ Characterization of Thin Film Growth book cover

In Situ Characterization of Thin Film Growth

Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.

Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.

With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area.

Hardbound, 296 Pages

Published: October 2011

Imprint: Woodhead Publishing

ISBN: 978-1-84569-934-5

Contents

  • Part 1 Electron diffraction techniques for studying thin film growth in situ: Reflection high-energy electron diffraction (RHEED) for in situ characterisation of thin film growth; Inelastic scattering techniques for in situ characterisation of thin film growth: Backscatter Kikuchi diffraction. Part 2 Photoemission techniques for studying thin film growth in situ: Ultraviolet photoemission spectroscopy (UPS) for in situ characterisation of thin film growth; X-ray photoelectron spectroscopy (XPS) for in situ characterisation of thin film growth; In situ spectroscopic ellipsometry (SP) for characterization of thin film growth. Part 3 Alternative in situ characterization techniques: In situ ion beam surface characterization of thin multicomponent films; Spectroscopies combined with (RHEED) for real time in situ surface monitoring of thin film growth; In situ deposition vapor monitoring; Real-time studies of epitaxial film growth using surface x-ray diffraction (SXRD).

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