In Situ Characterization of Thin Film Growth
- Gertjan Koster, University of Twente, The Netherlands
- Guus Rijnders, University of Twente, The Netherlands
Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.
With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area.
Materials scientists and engineers in the electronics and photonics industries, as well as all those with research interest in this area.
- Published: October 2011
- Imprint: Woodhead Publishing
- ISBN: 978-1-84569-934-5