High-Performance Embedded Computing

Applications in Cyber-Physical Systems and Mobile Computing


  • Marilyn Wolf, Farmer Distinguished Chair and Georgia Research Alliance Eminent Scholar at the Georgia Institute of Technology

High-Performance Embedded Computing, Second Edition, combines leading-edge research with practical guidance in a variety of embedded computing topics, including real-time systems, computer architecture, and low-power design. Author Marilyn Wolf presents a comprehensive survey of the state of the art, and guides you to achieve high levels of performance from  the embedded systems that bring these technologies together.

The book covers CPU design, operating systems, multiprocessor programs and architectures, and much more. Embedded computing is a key component of cyber-physical systems, which combine physical devices with computational resources for control and communication. This revised edition adds new content and examples of cyber-physical systems throughout the book, including design methodologies, scheduling, and wide-area CPS to illustrate the possibilities of these new systems.

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Professionals in high-performance and /or embedded computing; practitioners in cyber-physical systems, and students in graduate courses on these topics


Book information

  • Published: April 2014
  • ISBN: 978-0-12-410511-9

Table of Contents

A Historical Perspective
Chapter 1 A Review of Materials Science
1.1. Introduction
1.2. Structure
1.3. Defects in Solids
1.4. Bonds and Bands in Materials
1.5. Thermodynamics of Materials
1.6. Kinetics
1.7. Nucleation
1.8. An Introduction to Mechanical Behavior
1.9. Conclusion
Chapter 2 Vacuum Science and Technology
2.1. Introduction
2.2. Kinetic Theory of Gases
2.3. Gas Transport and Pumping
2.4. Vacuum Pumps
2.5. Vacuum Systems
2.6. Conclusion
Chapter 3 Thin-Film Evaporation Processes
3.1. Introduction
3.2. The Physics and Chemistry of Evaporation
3.3. Film Thickness Uniformity and Purity
3.4. Evaporation Hardware
3.5. Evaporation Processes and Applications
3.6. Conclusion
Chapter 4 Discharges, Plasmas, and Ion-Surface Interactions
4.1. Introduction
4.2. Plasmas, Discharges, and Arcs
4.3. Fundamentals of Plasma Physics
4.4. Reactions in Plasmas
4.5. Physics of Sputtering
4.6. Ion Bombardment Modification of Growing Films
4.7. Conclusion
Chapter 5 Plasma and Ion Beam Processing of Thin Films
5.1. Introduction
5.2. DC, AC, and Reactive Sputtering Processes
5.3. Magnetron Sputtering
5.4. Plasma Etching
5.5. Hybrid and Modified PVD Processes
5.6. Conclusion
Chapter 6 Chemical Vapor Deposition
6.1. Introduction
6.2. Reaction Types
6.3. Thermodynamics of CVD
6.4. Gas Transport
6.5. Film Growth Kinetics
6.6. Thermal CVD Processes
6.7. Plasma-Enhanced CVD Processes
6.8. Some CVD Materials Issues
6.9. Safety
6.10. Conclusion
Chapter 7 Substrate Surfaces and Thin-Film Nucleation
7.1. Introduction
7.2. An Atomic View of Substrate Surfaces
7.3. Thermodynamic Aspects of Nucleation
7.4. Kinetic Processes in Nucleation and Growth
7.5. Experimental Studies of Nucleation and Growth
7.6. Conclusion
Chapter 8 Epitaxy
8.1. Introduction
8.2. Manifestations of Epitaxy
8.3. Lattice Misfit and Defects in Epitaxial Films
8.4. Epitaxy of Compound Semiconductors
8.5. High-Temperature Methods for Depositing Epitaxial Semiconductor Films
8.6. Low-Temperature Methods for Depositing Epitaxial Semiconductor Films
8.7. Mechanisms and Characterization of Epitaxial Film Growth
8.8. Conclusion
Chapter 9 Film Structure
9.1. Introduction
9.2. Structural Morphology of Deposited Films and Coatings
9.3. Computational Simulations of Film Structure
9.4. Grain Growth, Texture, and Microstructure Control in Thin Films
9.5. Constrained Film Structures
9.6. Amorphous Thin Films
9.7. Conclusion
Chapter 10 Characterization of Thin Films and Surfaces
10.1. Introduction
10.2. Film Thickness
10.3. Structural Characterization of Films and Surfaces
10.4. Chemical Characterization of Surfaces and Films
10.5. Conclusion
Chapter 11 Interdiffusion, Reactions, and Transformations in Thin Films
11.1. Introduction
11.2. Fundamentals of Diffusion
11.3. Interdiffusion in Thin Metal Films
11.4. Compound Formation and Phase Transformations in Thin Films
11.5. Metal-Semiconductor Reactions
11.6. Mass Transport in Thin Films under Large Driving Forces
11.7. Conclusion
Chapter 12 Mechanical Properties of Thin Films
12.1. Introduction
12.2. Mechanical Testing and Strength of Thin Films
12.3. Analysis of Internal Stress
12.4. Techniques for Measuring Internal Stress in Films
12.5. Internal Stresses in Thin Films and Their Causes
12.6. Mechanical Relaxation Effects in Stressed Films
12.7. Adhesion
12.8. Conclusion