Handbook of VLSI Microlithography
Principles, Technology and Applications
- William B. Glendinning, Motorola, USA
- John N. Helbert, Motorola, USA
The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.
Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
For workers in the Very Large Scale Integrated Circuit (VLSI) industry involved with production of high density integrated circuit semiconductors such as DRAM--including production engineers, research and development scientists and technicians as well as academics.
- Published: January 1991
- Imprint: WILLIAM ANDREW
- ISBN: 978-0-8155-1281-3
Table of ContentsIssues and Trends Affecting Lithography Tool Selection Strategy
Resist Technology Ã¹ Design, Processing, and Applications
Lithography Process Monitoring and Defect Detection
Techniques and Tools for Photo Metrology
Techniques and Tools for Optical Lithography
Microlithography Tool Automation
Electron-Beam ULSI Applications
Rational Vibration and Structural Dynamics for Lithographic Tool Installations
Applications of Ion Microbeams Lithography and Direct Processing