Handbook of Thin Film Deposition book cover

Handbook of Thin Film Deposition

The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes.  In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

Audience
New third edition of the popular book on deposition. Aimed at engineers, technicians, and plant personnel in the semiconductor and related industries.

Hardbound, 408 Pages

Published: June 2012

Imprint: William Andrew

ISBN: 978-1-4377-7873-1

Contents

  • Foreword to the Third Edition

    Scaling of Devices and Thermal Scaling

    PVD - Special Topics

    CVD New Developments

    CVD Equipment

    CMP Method and Practice

    Process Technology for Copper Interconnects

    Optical Thin Films

    Thin Films in Photovoltaics

    Thin Films in Memory Applications

    Index

Advertisement

advert image