Handbook of Silicon Wafer Cleaning Technology, 2nd EditionEdited by
- Karen Reinhardt
- Werner Kern
Managers, engineers, and technicians that manufacture integrated circuits or supply the semiconductor and microelectronics industries.
Hardbound, 660 Pages
Published: January 2008
Imprint: William Andrew
- Part 1: Introduction and Overview1. Overview and Evolution of Silicon Wafer Cleaning Technology2. Overview of Wafer Contamination and DefectivityPart 2: Wet-Chemical Processes3. Particle Deposition and Adhesion4. Aqueous Cleaning and Surface Conditioning ProcessesPart 3: Dry Cleaning Processes5. Gas-phase Wafer Cleaning Technology6. Plasma Stripping and Cleaning7. Cryogenic Aerosols and Supercritical Fluid CleaningPart 4: Analytical and Control Aspects8. Detection and Measurement of Particulate Contaminants9. Surface Chemical Composition and Morphology10. Ultratrace Impurity and Surface Morphology Analysis11. Analysis and Control of Electrically Active ContaminantsPart 5: Directions for the Near Future