Developments in Surface Contamination and Cleaning
Fundamentals and Applied AspectsEdited by
- Rajiv Kohli, National Aeronautics and Space Administration (NASA), Houston, Texas, U.S.A.
- Kashmiri L. Mittal, Editor: 'Reviews of Adhesion and Adhesives'
Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.
Research & development, manufacturing, quality control and procurement specification personnel in many and diversified industries; such as microelectronics, aerospace, optics, xerography, joining (adhesive bonding), and biomedical. Academia and government will also find this book an excellent source.
Hardbound, 1200 Pages
Published: January 2008
Imprint: William Andrew
- IntroductionPart 1: Fundamentals1. The Physical Nature of Very, Very Small Particles and its Impact on their Behavior Othmar Preining 2. Elucidating the Nature of Very Small Particles Carlo Altucci and Domenico Paparo 3. Transport and Deposition of Aerosol Particles Daniel J. Rader and Anthony S. Geller 4. Relevance of Particle Transport in Surface Deposition and Cleaning Chao-Hsin Lin and Chao Zhu 5. Tribological Implications of Particles Koji Kato6. Airborne Molecular Contamination Taketoshi Fujimoto, Kikuo Takeda and Tatsuo Nonaka7. Engineering Aspects of Particle Adhesion and Removal David J. Quesnel, Donald S. Rimai and David M. Schaefer8. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition Larry Levit and Arnold SteinmanPart 2: Characterization of Surface Contaminants9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles Zhong Lin Wang and Jean L. Lee10. Surface Analysis Methods for Contaminant Identification David A. Cole and Lei Zhang 11. Ionic Contamination and Analytical Techniques for Ionic Contamination Beverly Newton12. Relevance of Colorimetric Interferometry for Thin Surface Film Contaminants Michel Querry, Philippe Vergne and Jerome Molinard13. Wettability Techniques to Monitor the Cleanliness of Surfaces William Birch, Alain Carre and Kashmiri L. MittalPart 3: Methods for Removal of Surface Contamination 14. The Use of Surfactants to Enhance Particle Removal from Surfaces Michael L. Free15. Cleaning with Solvents John B. Durkee16. Removal of Particles by Chemical Cleaning Philip G. Clark and Thomas J. Wagener17. Cleaning Using High-Speed Impinging Jet Kuniaki Gotoh18. Microabrasive Precision Cleaning and Processing Technology Rajiv Kohli 19. Cleaning Using Argon/Nitrogen Cryogenic Aerosols Wayne T. McDermott and Jeffrey W. Butterbaugh20. Carbon Dioxide Snow Cleaning Robert Sherman21. Coatings for Preventing or Deactivation of Biological Contaminants Joerg C. Tiller 22. Detailed Study of Semiconductor Wafer Drying Wim Feyn, Frank Hosteyns, Twan Bearda, Sophia Arnauts and Jan Van Steenburgen