Developments in Surface Contamination and Cleaning book cover

Developments in Surface Contamination and Cleaning

Fundamentals and Applied Aspects

Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are ôkiller defectsö today, with serious implications for yield and reliability of the components. This book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed. Special emphasis is placed on the behaviour of nanoscale particles. The book is amply referenced and profusely illustrated.

Audience
Research & development, manufacturing, quality control and procurement specification personnel in many and diversified industries; such as microelectronics, aerospace, optics, xerography, joining (adhesive bonding), and biomedical. Academia and government will also find this book an excellent source.

Hardbound, 1200 Pages

Published: December 2007

Imprint: William Andrew

ISBN: 978-0-8155-1555-5

Contents

  • IntroductionPart 1: FundamentalsThe Physical Nature of Very, Very Small Particles and its Impact on their BehaviorElucidating the Nature of Very Small ParticlesTransport and Deposition of Aerosol ParticlesRelevance of Particle Transport in Surface Deposition and CleaningTribological Implications of ParticlesAirborne Molecular ContaminationEngineering Aspects of Particle Adhesion and RemovalESD Controls in Cleanroom Environments: Relevance to Particle DepositionPart 2: Characterization of Surface ContaminantsElectron Microscopy Techniques for Imaging and Analysis of NanoparticlesSurface Analysis Methods for Contaminant IdentificationIonic Contamination and Analytical Techniques for Ionic ContaminationRelevance of Colorimetric Interferometry for Thin Surface Film ContaminantsWettability Techniques to Monitor the Cleanliness of SurfacesPart 3: Methods for Removal of Surface Contamination The Use of Surfactants to Enhance Particle Removal from SurfacesCleaning with SolventsRemoval of Particles by Chemical CleaningCleaning Using High-Speed Impinging JetMicroabrasive Precision Cleaning and Processing TechnologyPrecision Cleaning Using Microdroplet BeamsCleaning Using Argon/Nitrogen Cryogenic AerosolsCarbon Dioxide Snow CleaningCoatings for Preventing or Deactivation of Biological ContaminantsDetailed Study of Semiconductor Wafer Drying

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