Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI ApplicationsBy
- John E.J. Schmitz
Engineers and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, filter and other industries.
Hardbound, 251 Pages
Published: December 1992
Imprint: William Andrew
"After reading this book, an engineer should have all the necessary background." - European Semiconductor