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Advances in Research and Development

Modeling of Film Deposition for Microelectronic Applications

  • 1st Edition, Volume 23 - September 29, 1997
  • Editors: Maurice H. Francombe, John L. Vossen
  • Language: English
  • Hardback ISBN:
    9 7 8 - 0 - 1 2 - 5 3 3 0 2 3 - 7
  • eBook ISBN:
    9 7 8 - 0 - 0 8 - 0 5 4 2 9 0 - 4

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed… Read more

Advances in Research and Development

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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.