Advances in Research and Development: Plasma Sources for Thin Film Deposition and Etching
Series Editor:- Maurice Francombe, Georgia State University, Atlanta, U.S.A.
- John Vossen, RCA Laboratories, Princeton, New Jersey
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
Audience
Libraries, researchers in electrical engineering, condensed matter physics, and materials science departments. All academic and industrial thin film researchers.
Hardbound, 328 Pages
Published: August 1994
Imprint: Academic Press
ISBN: 978-0-12-533018-3
Contents
- M.A. Lieberman and R.A. Gottscho, Design of High- Density Plasma Sources for Materials Processing. O.A. Popov, Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films. S.L. Rohde, Unbalanced Magnetron Sputtering. C. Steinbruchel, The Formation of Particles in Thin-Film Processing Plasmas. References. Author Index. Subject Index.
