Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications, 22
Modeling of Film Deposition for Microelectronic Applications
- Ronald Powell, Novellus Systems, Inc., Palo Alto, California
- Abraham Ulman, Polytechnic University, Brooklyn, New York
- John Vossen, RCA Laboratories, Princeton, New Jersey
- Maurice Francombe, Georgia State University, Atlanta, U.S.A.
Researchers in thin films; AVS; microelectronics and computer simulation in this field.
- Published: October 1996
- Imprint: ACADEMIC PRESS
- ISBN: 978-0-12-533022-0