Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications, 22 book cover

Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications, 22

Modeling of Film Deposition for Microelectronic Applications

Hardbound, 290 pages

Published: October 1996

Imprint: Academic Press

ISBN: 978-0-12-533022-0

Contents

  • M.J. Brett, S.K. Dew, and T.J. Smy, Thin Film Microstructure and Process Simulation Using SIMBAD. S. Hamaguchi, Mathematical Methods for Thin Films Deposition Simulations. C.-C. Fang, V. Prasad, R.V. Joshi, F. Jones, and J.J. Hsieh, A Process Model for Sputter-Deposition of Thin Films Using Molecular Dynamics. T.S. Cale and V. Mahadev, Feature Scale Transport and Reaction during Low Pressure. Chapter References. Author Index. Subject Index.

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