Advances in Imaging and Electron Physics
Series Editor:- Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France
Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.
This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Audience
Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general
Included in series
Advances in Imaging and Electron Physics
Advances in Imaging and Electron Physics
Hardbound, 440 Pages
Published: May 2012
Imprint: Academic Press
ISBN: 978-0-12-394297-5
Contents
- Derivation of the Reflection Equations for Higher Order Aberrations of Local Wavefronts by Oblique Incidence
G. Esser, W. Becken, W. Müller, P. Baumbach, J. Arasa, D. Uttenweiler - Thermal Imaging in Medicine
Lila Iznita Izhar and Maria Petrou - Derivation of the Radiative Transfer Equation in a Medium with a Spatially Varying Refractive Index: A Review
Jean-Michel Tualle - Imaging Mass Spectrometry - Sample Preparation, Instrumentation and Applications
Kamlesh Shrivas and Mitsutoshi Setou - Transformation Optics
Robert T. Thompson and Steven A. Cummer - TSEM - A Review of Scanning Electron Microscopy in Transmission Mode and Its Applications
Tobias Klein, Egbert Buhr and Carl Georg Frase - Logarithmic Image Processing: Additive Contrast, Multiplicative Contrast and Associated Metrics
M. Jourlina, M. Carr´e, J. Breugnot and M. Bouabdellah
- Derivation of the Reflection Equations for Higher Order Aberrations of Local Wavefronts by Oblique Incidence
