Advances in Imaging and Electron Physics
Aberration-corrected microscopy
Series Editor:- Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France
Audience
All users of electron microscopes as well as physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.
Included in series
Advances in Imaging and Electron Physics
Advances in Imaging and Electron Physics
Hardbound, 590 Pages
Published: December 2008
Imprint: Academic Press
ISBN: 978-0-12-374220-9
Contents
- History of aberration correction in electron microscopy (H. Rose)Present and future hexapole aberration correctors for high resolution electron microscopy (M. Haider)Aberration correction and STEM (O.L. Krivanek)First results using the Nion third order STEM corrector (P. Batson) STEM and EELS: Mapping materials atom by atom (A.B. Bleloch) Aberration correction with the SACTEM-Toulouse: from imaging to diffraction (M. Hÿtch, F. Hüe, E. Snoeck and F. Houdellier) Novel aberration corrections concepts (B. Kabius) Aberration corrected imaging in CTEM and STEM (A. Kirkland, P.D. Nellist, Lan-Yun Chang and S.J. Haigh)Materials applications of aberration-corrected STEM (S.J. Pennycook, M. F. Chisholm, A. R. Lupini, M. Varela, K. van Benthem, A. Y. Borisevich, M. P. Oxley, W. Luo and S. T. Pantelides)Spherical aberration corrected transmission electron microscopy for nanomaterials in Japan (N. Tanaka)Aberration correction in practice (K. Urban and J. Mayer) Aberration-corrected electron microscopes at Brookhaven National Laboratory (Y. Zhu and J. Wall)
