Advances in Imaging and Electron Physics
By- Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Audience
Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.
Advances in Imaging and Electron Physics
Hardbound, 264 Pages
Published: September 2006
Imprint: Academic Press
ISBN: 978-0-12-014785-4
Contents
- Electron-Beam-Induced Nanometer-Scale Deposition (C.W. Hagen, N. Silvis-Cividjian).
Introduction.
Electron-Beam-Induced Deposition: A Literature Survey.
The Theory of EBID Spatial Resolution.
The Role of Secondary Electrons in EBID.
Delocalization Effects in EBID.
Conclusions.
References.
Index.

